Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | MGLL | Q99685 | 1/20 | 0.36 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4456327 | 0.91 | LMNA (0.43) | LMNAPOLBALDH1A1 | |
| SCHEMBL156499 | 0.88 | LMNA (0.41) | LMNAPOLBALDH1A1MGLLPDK1 | |
| SCHEMBL154822 | 0.82 | LMNA (0.44) | LMNAPOLBALDH1A1MGLLPDK1 | |
| SCHEMBL1759150 | 0.81 | LMNA (0.34) | LMNA | |
| SCHEMBL1759151 | 0.81 | LMNA (0.34) | LMNA | |
| SCHEMBL1291716 | 0.78 | LMNA (0.42) | LMNA | |
| SCHEMBL1291717 | 0.78 | LMNA (0.42) | LMNA | |
| SCHEMBL29045575 | 0.77 | LMNA (0.62) | LMNAPOLBALDH1A1MGLL | |
| SCHEMBL27638853 | 0.74 | ALDH1A1 (0.50) | ALDH1A1MGLL | |
| SCHEMBL6955855 | 0.73 | LMNA (0.53) | LMNAPOLBALDH1A1MGLL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7320854-B2 | Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent | JSR CORPORATION (JP) | 2008-01-22 | — | — | US | disclosed |
| EP-1494072-A2 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR Corporation (JP) | 2005-01-05 | — | — | EP | disclosed |
| US-20040265737-A1 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |