SCHEMBL4862267

SCHEMBL4862267

C=C(C(=O)OC(C(F)(F)F)C(F)(F)F)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ABHD6 Q9BV23 7/20 0.33
MGLL Q99685 3/20 0.31
PLA2G7 Q13093 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16409376 0.88
SCHEMBL11964319 0.85 CA1 (0.31)
SCHEMBL25962742 0.83 ABHD6 (0.31) ABHD6
SCHEMBL14133247 0.83
SCHEMBL15999600 0.81
SCHEMBL15824292 0.80 CA1 (0.36) ABHD6MGLLPLA2G7
SCHEMBL9578485 0.79
SCHEMBL20103099 0.79
SCHEMBL12966440 0.79
SCHEMBL5144817 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7417100-B2 Transparent fluorine-containing copolymer CENTRAL GLASS COMPANY, LIMITED (JP) 2008-08-26 US claimed
US-7060771-B2 Transparent fluorine-containing copolymer CENTRAL GLASS COMPANY, LIMITED (JP) 2006-06-13 US claimed
US-20060063902-A1 Transparent fluorine-containing copolymer CENTRAL GLASS CO., LTD. (JP) 2006-03-23 US claimed
US-20030236369-A1 Transparent fluorine-containing copolymer CENTRAL GLASS COMPANY, LIMITED (JP) 2003-12-25 US claimed
US-4613657-A APROTIC SOLVENT ALKALI METAL ALKOXIDE, OPTICS, PAINTS, RESISTS CENTRAL GLASS COMPANY, LIMITED (JP) 1986-09-23 US claimed
US-12032288-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-20230266675-A1 INSPECTION METHOD, METHOD FOR PRODUCING COMPOSITION, AND METHOD FOR VERIFYING COMPOSITION FUJIFILM CORPORATION (JP) 2023-08-24 US disclosed
US-20230221644-A1 METHOD FOR PRODUCING COMPOSITION FOR FORMING NON-PHOTOSENSITIVE UPPER LAYER FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-07-13 US disclosed
US-20230185192-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-06-15 US disclosed
US-20230148344-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND FUJIFILM CORPORATION (JP) 2023-05-11 US disclosed
WO-2023054126-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN-FORMING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD 富士フイルム株式会社 2023-04-06 WO disclosed
US-20230043143-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-02-09 US disclosed
US-20060178457-A1 Optical members and polymerizable compositions and thio compounds for producing them FUJIFILM CORPORATION (JP) 2006-08-10 US disclosed
US-7060771-B2 Transparent fluorine-containing copolymer CENTRAL GLASS COMPANY, LIMITED (JP) 2006-06-13 US disclosed
US-20060063902-A1 Transparent fluorine-containing copolymer CENTRAL GLASS CO., LTD. (JP) 2006-03-23 US disclosed
EP-1581595-A1 OPTICAL MEMBERS AND POLYMERIZABLE COMPOSITIONS AND THIO COMPOUNDS FOR PRODUCING THEM FUJI PHOTO FILM CO., LTD. (JP) 2005-10-05 EP disclosed
WO-2004061009-A1 OPTICAL MEMBERS AND POLYMERIZABLE COMPOSITIONS AND THIO COMPOUNDS FOR PRODUCING THEM FUJI PHOTO FILM CO., LTD. (JP) 2004-07-22 WO disclosed
US-20030236369-A1 Transparent fluorine-containing copolymer CENTRAL GLASS COMPANY, LIMITED (JP) 2003-12-25 US disclosed
US-4613657-A APROTIC SOLVENT ALKALI METAL ALKOXIDE, OPTICS, PAINTS, RESISTS CENTRAL GLASS COMPANY, LIMITED (JP) 1986-09-23 US disclosed
US-4609715-A RADICALLY POLYMERIZED CENTRAL GLASS COMPANY, LIMITED (JP) 1986-09-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12032288-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device RER1, COL1A1, RAD51 ABHD6 226/4885MGLL 1138/4885PLA2G7 1212/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.