Malonic Acid

Malonic Acid

SCHEMBL4864852

CC(O)N(C(C)O)C(C)O.O=C(O)CC(=O)O

nearest known ligand 0.53

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LDHA P00338 1/20 0.53
SRR Q9GZT4 1/20 0.53
TP53 P04637 1/20 0.40
SLC22A6 Q4U2R8 1/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C19 P33261 1/20 0.36
ALDH1A1 P00352 1/20 0.36
LMNA P02545 1/20 0.36
MAPT P10636 1/20 0.36
PTGS2 P35354 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
FFAR3 O14843 1/20 0.35
GABRP O00591 2/20 0.35
GABRD O14764 2/20 0.35
GABRA1 P14867 2/20 0.35
GABRB1 P18505 2/20 0.35
GABRG2 P18507 2/20 0.35
GABRB3 P28472 2/20 0.35
GABRA5 P31644 2/20 0.35
GABRA3 P34903 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Succinic Acid SCHEMBL5874469 0.86 EGLN1 (0.50) ALDH1A1LMNAFFAR3GABRPGABRD
Propionic Acid SCHEMBL3844795 0.86 FFAR3 (0.56) LDHASRRTP53SLC22A6CYP2D6
Malonic Acid SCHEMBL4413838 0.86 LDHA (0.50) LDHASRRTP53SLC22A6CYP2D6
Malonic Acid SCHEMBL4419779 0.86 LDHA (0.50) LDHASRRTP53SLC22A6CYP2D6
Malonic Acid SCHEMBL30288562 0.84 LDHA (0.64) LDHASRRTP53SLC22A6CYP2D6
Bicarbonate SCHEMBL5874276 0.84 TP53 (0.47) TP53CYP2D6CYP2C19ALDH1A1LMNA
Chloroacetic Acid SCHEMBL5874831 0.83 TSHR (0.53) LDHASRRTP53SLC22A6CYP2D6
Glycine SCHEMBL3747355 0.83 GLRA1 (0.53) LDHASRRTP53SLC22A6CYP2D6
Oxalic Acid SCHEMBL5875009 0.81 TP53 (0.44) TP53CYP2D6CYP2C19ALDH1A1LMNA
Acetic Acid SCHEMBL5874694 0.81 FFAR3 (0.47) TP53CYP2D6CYP2C19ALDH1A1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240138403-A1 Synergistic Combinations for Reducing Volatility of Auxin Herbicides ETHOX CHEMICALS, LLC 2024-05-02 US claimed
US-20230021295-A1 Synergistic Combinations for Reducing Volatility of Auxin Herbicides ETHOX CHEMICALS, LLC 2023-01-19 US claimed
WO-2023278670-A1 SYNERGISTIC COMBINATIONS FOR REDUCING VOLATILITY OF AUXIN HERBICIDES ETHOX CHEMICALS, LLC (US) 2023-01-05 WO claimed
EP-1603523-B1 Method for overcoming in-grown hair UNILEVER PLC (GB) 2007-06-06 EP claimed
EP-1603523-A1 COMPOSITIONS USEFUL TO PREVENT IN-GROWN HAIR ARISING FROM SHAVING UNILEVER PLC (GB) 2005-12-14 EP claimed
US-20050202054-A1 Methods and compositions useful to prevent in-grown hair arising from shaving UNILEVEER HOME & PERSONAL CARE USA, DIVISION OF CONOPCO, INC. 2005-09-15 US claimed
WO-2004082651-A1 COMPOSITIONS USEFUL TO PREVENT IN-GROWN HAIR ARISING FROM SHAVING UNILEVER PLC (GB) 2004-09-30 WO claimed
US-20240138403-A1 Synergistic Combinations for Reducing Volatility of Auxin Herbicides ETHOX CHEMICALS, LLC 2024-05-02 US disclosed
US-20230021295-A1 Synergistic Combinations for Reducing Volatility of Auxin Herbicides ETHOX CHEMICALS, LLC 2023-01-19 US disclosed
WO-2023278670-A1 SYNERGISTIC COMBINATIONS FOR REDUCING VOLATILITY OF AUXIN HERBICIDES ETHOX CHEMICALS, LLC (US) 2023-01-05 WO disclosed
US-7404949-B2 Methods and compositions useful to prevent in-grown hair arising from shaving UNILEVER HOME & PERSONAL CARE USA, DIVISION OF CONOPCO, INC. (US) 2008-07-29 US disclosed
EP-1603523-B1 Method for overcoming in-grown hair UNILEVER PLC (GB) 2007-06-06 EP disclosed
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20050202054-A1 Methods and compositions useful to prevent in-grown hair arising from shaving UNILEVEER HOME & PERSONAL CARE USA, DIVISION OF CONOPCO, INC. 2005-09-15 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed