SCHEMBL486510

SCHEMBL486510

C[Si](C)(CCCN)c1ccc([Si](C)(C)CCCN)cc1

nearest known ligand 0.43

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
NR1H2 P55055 3/20 0.43
NR1H3 Q13133 3/20 0.43
HRH1 P35367 2/20 0.31
MGAM O43451 1/20 0.30
MAOA P21397 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3919950 0.93 NR1H2 (0.42) NR1H2NR1H3HRH1MAOA
SCHEMBL3865502 0.89 MGAM (0.40) NR1H2NR1H3HRH1MGAMMAOA
SCHEMBL7960568 0.84 NR1H2 (0.35) NR1H2NR1H3
SCHEMBL3923573 0.84 NR1H2 (0.39) NR1H2NR1H3
SCHEMBL7955809 0.82 NR1H2 (0.32) NR1H2NR1H3MGAMMAOA
SCHEMBL17124988 0.77 NR1H2 (0.63) NR1H2NR1H3
SCHEMBL6003572 0.76 MAOA (0.37) HRH1MAOA
SCHEMBL25353827 0.75 NR1H2 (0.67) NR1H2NR1H3MGAM
SCHEMBL10346774 0.75 CYP1A2 (0.39) NR1H2NR1H3HRH1MGAMMAOA
SCHEMBL8625948 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 409 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121379180-B Polyphosphoric acid-SBS polymer composite modified biological asphalt and asphalt mixture 长沙理工大学 2026-05-19 CN claimed
CN-119556528-A Photosensitive resin composition and application thereof 波米科技有限公司 2025-03-04 CN claimed
CN-116560188-B Photosensitive resin composition, photosensitive resin sheet and application thereof 波米科技有限公司 2024-02-13 CN claimed
CN-116560188-A Photosensitive resin composition, photosensitive resin sheet and application thereof 波米科技有限公司 2023-08-08 CN claimed
CN-116496319-A Phosphine reagent, preparation method thereof and application of phosphine reagent in preparation of quinoxaline compounds 波米科技有限公司 2023-07-28 CN claimed
CN-114805810-B Photosensitive polyimide precursor resin, preparation method and photosensitive resin composition 波米科技有限公司 2023-06-02 CN claimed
CN-115073732-B Block type photosensitive polyimide precursor resin, preparation method thereof and block type photosensitive resin composition 波米科技有限公司 2023-06-02 CN claimed
CN-114381248-B Modified titanium dioxide nano plugging agent and water-based drilling fluid 西南石油大学 2023-03-03 CN claimed
CN-114381248-A Modified titanium dioxide nano plugging agent and water-based drilling fluid 西南石油大学 2022-04-22 CN claimed
CN-112322249-B Polyesteramide silane enhanced hot melt adhesive and preparation method thereof 温州华特热熔胶股份有限公司 2022-04-01 CN claimed
US-7825208-B2 Golf equipment formed from amine-adduct modified polyurea compositions ACUSHNET COMPANY (US) 2010-11-02 US claimed
US-7705102-B2 Coverings for golf balls of a polysiloxaneurea copolymer based on a polysiloxane having an oxirane-terminated end group reacted with adiamine followed by a diisocyanate; controllable kinetics; homogeneity;shrinkage inhibition; chemical resistance; thermoplastic resins ACUSHNET COMPANY (US) 2010-04-27 US claimed
US-20060178233-A1 Golf equipment formed from amine-adduct modified polyurea compositions JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT 2006-08-10 US claimed
US-20060173139-A1 Golf equipment formed from amine-adduct modified polyurea compositions JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT 2006-08-03 US claimed
US-6274754-B1 HYDROSILYLATION; N,N-BIS(TRIMETHYLSILYL)ALLYLAMINE AND BIS(DIMETHYLSILYL)BENZENE IN PRESENCE OF PLATINUM CATALYST SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-08-14 US claimed
US-5248760-A CHEMICALLY CURED LOW TEMPERATURE POLYIMIDES UNC AT CHARLOTTE (US) 1993-09-28 US claimed
WO-1992013024-A1 CHEMICALLY CURED LOW TEMPERATURE POLYIMIDES THE UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (US) 1992-08-06 WO claimed
JP-7240022-A None JP disclosed
JP-S61176630-A PRODUCTION OF HEAT-RESISTANT RESIN SUMITOMO BAKELITE CO LTD 1986-08-08 JP disclosed
EP-0172330-A1 Photocurable composition KABUSHIKI KAISHA TOSHIBA (JP) 1986-02-26 EP disclosed