SCHEMBL4865593

SCHEMBL4865593

C=C(C)C(=O)Oc1ccc(C(=O)O)cc1C(=O)O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.53
KDM4E B2RXH2 3/20 0.53
RAB9A P51151 2/20 0.53
ALDH1A1 P00352 2/20 0.53
GAA P10253 1/20 0.53
CFD P00746 2/20 0.51
ELANE P08246 1/20 0.47
CA12 O43570 1/20 0.47
CA1 P00915 1/20 0.47
CA2 P00918 1/20 0.47
CA4 P22748 1/20 0.47
CA6 P23280 1/20 0.47
CA7 P43166 1/20 0.47
TPMT P51580 1/20 0.47
CA9 Q16790 1/20 0.47
CA14 Q9ULX7 1/20 0.47
HTT P42858 3/20 0.46
TDP1 Q9NUW8 2/20 0.46
POLB P06746 1/20 0.46
APEX1 P27695 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27488934 0.88 MAPT (0.48) TSHRKDM4ERAB9AALDH1A1GAA
SCHEMBL4863909 0.87 KDM4E (0.53) TSHRKDM4ERAB9AALDH1A1GAA
SCHEMBL5323841 0.83 CFD (0.51) TSHRKDM4ERAB9AALDH1A1GAA
SCHEMBL21526705 0.82 TSHR (0.55) TSHRKDM4ERAB9AALDH1A1GAA
SCHEMBL21526687 0.82 TSHR (0.73) TSHRKDM4ERAB9AALDH1A1GAA
SCHEMBL3803677 0.82 ALDH1A1 (0.50) TSHRKDM4ERAB9AALDH1A1GAA
SCHEMBL27051778 0.80 TSHR (0.53) TSHRKDM4ERAB9AALDH1A1GAA
SCHEMBL8441120 0.80 CFD (0.59) TSHRKDM4ERAB9AALDH1A1GAA
SCHEMBL65777 0.79 CFD (0.44) TSHRKDM4ERAB9AALDH1A1GAA
SCHEMBL27522355 0.79 KDM4E (0.47) TSHRKDM4ERAB9AALDH1A1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7378224-B2 Method for forming pattern, and optical element JSR CORPORATION (JP) 2008-05-27 US disclosed
EP-1296186-B1 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORP (JP) 2006-06-07 EP disclosed
US-6852476-B2 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORPORATION (JP) 2005-02-08 US disclosed
US-20050014100-A1 Method for forming pattern, and optical element JSR CORPORATION (JP) 2005-01-20 US disclosed
EP-1498776-A2 Method for forming pattern, and optical element JSR Corporation (JP) 2005-01-19 EP disclosed
US-20030068574-A1 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORPORATION (JP) 2003-04-10 US disclosed
EP-1296186-A1 Radiation sensitive resin composition, rib, rib forming method and display element JSR Corporation (JP) 2003-03-26 EP disclosed
EP-0880075-B1 Radiation sensitive resin composition JSR CORP (JP) 2001-10-17 EP disclosed
US-5958648-A Radiation sensitive resin composition JSR CORPORATION (JP) 1999-09-28 US disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed