SCHEMBL4863909

SCHEMBL4863909

C=C(C)C(=O)Oc1cc(C(=O)O)ccc1C(=O)O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 5/20 0.53
TSHR P16473 4/20 0.53
ALDH1A1 P00352 4/20 0.53
RAB9A P51151 3/20 0.53
GAA P10253 1/20 0.53
ELANE P08246 1/20 0.47
CA12 O43570 1/20 0.47
CA1 P00915 1/20 0.47
CA2 P00918 1/20 0.47
CA4 P22748 1/20 0.47
CA6 P23280 1/20 0.47
CA7 P43166 1/20 0.47
TPMT P51580 1/20 0.47
CA9 Q16790 1/20 0.47
CA14 Q9ULX7 1/20 0.47
HTT P42858 3/20 0.46
TDP1 Q9NUW8 2/20 0.46
POLB P06746 1/20 0.46
APEX1 P27695 1/20 0.46
HPGD P15428 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27051778 0.87 TSHR (0.53) KDM4ETSHRALDH1A1RAB9AGAA
SCHEMBL4865593 0.87 TSHR (0.53) KDM4ETSHRALDH1A1RAB9AGAA
SCHEMBL8820224 0.84 KDM4E (0.73) KDM4ETSHRALDH1A1RAB9AGAA
SCHEMBL27962389 0.84 HSD17B2 (0.49) KDM4EALDH1A1RAB9AELANECA12
SCHEMBL3800839 0.82 ALDH1A1 (0.63) KDM4ETSHRALDH1A1GAAELANE
SCHEMBL21526687 0.82 TSHR (0.73) KDM4ETSHRALDH1A1RAB9AGAA
SCHEMBL14339914 0.82 KDM4E (0.49) KDM4ETSHRALDH1A1GAAELANE
SCHEMBL8440044 0.80 KDM4E (0.77) KDM4ETSHRALDH1A1RAB9AGAA
SCHEMBL28052889 0.80 KDM4E (0.46) KDM4ETSHRALDH1A1RAB9AELANE
SCHEMBL65777 0.79 CFD (0.44) KDM4ETSHRALDH1A1RAB9AGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100416311-C Spacer plate for ink jet colour filter JSR CORP (JP) 2008-09-03 CN disclosed
US-7378224-B2 Method for forming pattern, and optical element JSR CORPORATION (JP) 2008-05-27 US disclosed
EP-1296186-B1 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORP (JP) 2006-06-07 EP disclosed
CN-1598695-A Method for forming pattern, and optical element JSR CORP (JP) 2005-03-23 CN disclosed
US-6852476-B2 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORPORATION (JP) 2005-02-08 US disclosed
US-20050014100-A1 Method for forming pattern, and optical element JSR CORPORATION (JP) 2005-01-20 US disclosed
EP-1498776-A2 Method for forming pattern, and optical element JSR Corporation (JP) 2005-01-19 EP disclosed
US-20030068574-A1 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORPORATION (JP) 2003-04-10 US disclosed
CN-1409132-A Spacer plate for ink jet colour filter JSR CORP (JP) 2003-04-09 CN disclosed
EP-1296186-A1 Radiation sensitive resin composition, rib, rib forming method and display element JSR Corporation (JP) 2003-03-26 EP disclosed
EP-0880075-B1 Radiation sensitive resin composition JSR CORP (JP) 2001-10-17 EP disclosed
US-5958648-A Radiation sensitive resin composition JSR CORPORATION (JP) 1999-09-28 US disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed