SCHEMBL4866878

SCHEMBL4866878

C(OCC1CO1)C1CO1.C=C(C)C(=O)OCC(C)O

nearest known ligand 0.64

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.64
TSHR P16473 5/20 0.49
TP53 P04637 1/20 0.37
CYP3A4 P08684 1/20 0.37
THRB P10828 1/20 0.36
MAPK1 P28482 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.33
TDP1 Q9NUW8 1/20 0.32
MGLL Q99685 2/20 0.31
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL9005419 0.96 ALDH1A1 (0.59) ALDH1A1TSHRTP53CYP3A4THRB
SCHEMBL4627030 0.93 ALDH1A1 (0.76) ALDH1A1TSHRTP53CYP3A4THRB
SCHEMBL27761029 0.86 ALDH1A1 (0.60) ALDH1A1TSHRTP53CYP3A4THRB
Propylene Oxide SCHEMBL5187461 0.84 TSHR (0.55) ALDH1A1TSHRTHRBMAPT
SCHEMBL27827895 0.84 ALDH1A1 (0.89) ALDH1A1TSHRTP53CYP3A4THRB
SCHEMBL5066134 0.84 ALDH1A1 (0.62) ALDH1A1TSHRTP53CYP3A4
Methacrylic Acid SCHEMBL27636063 0.82 ALDH1A1 (0.46) ALDH1A1TSHRTP53CYP3A4MAPK1
Propylene Glycol SCHEMBL9715931 0.82 ALDH1A1 (0.78) ALDH1A1TSHRTP53CYP3A4THRB
SCHEMBL28660999 0.82 ALDH1A1 (0.58) ALDH1A1TSHRTP53CYP3A4THRB
SCHEMBL7867270 0.82 ALDH1A1 (0.59) ALDH1A1TSHRTP53CYP3A4THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107112332-A Solid camera head, infrared ray-absorbable composition and planarization film formation curable adhensive compositions JSR株式会社 2017-08-29 CN disclosed
CN-107003449-A Solid-state imaging device and infrared-absorbing composition JSR株式会社 2017-08-01 CN disclosed
CN-103980472-B Containing the epoxy acrylate oligomer and its preparation method and application of fluorenes ZHANGJIAGANG KANGDEXIN PHOTOELECTRIC MATERIALS CO., LTD. (CN) 2016-03-02 CN disclosed
CN-105319849-A Photosensitive composition for forming shading board, shading board and display device JSR CORP 2016-02-10 CN disclosed
CN-103980472-A Epoxy acrylate low polymer containing fluorene as well as preparation method and application thereof ZHANGJIAGANG KANGDE XIN PHOTOELECTRIC MATERIAL CO LTD 2014-08-13 CN disclosed
EP-1564232-B1 PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR THE FORMATION OF HYDROGEL TOYO GOSEI CO LTD (JP) 2008-08-20 EP disclosed
US-7408002-B2 Photosensitive resin composition and process for the formation of hydrogel TOYO GOSEI CO., LTD (JP) 2008-08-05 US disclosed
US-20060041052-A1 Photosensitive resin compostion and process for the formation of hydrogel TOYO GOSEI CO., LTD (JP) 2006-02-23 US disclosed
EP-1564232-A1 PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR THE FORMATION OF HYDROGEL Toyo Gosei Co., Ltd. (JP) 2005-08-17 EP disclosed
US-6080833-A BIS(HYDROXYALKOXYLATED) 1,1'-SPIROBIINDAN POLYCARBONATES AND POLYESTERS POLYMERS AND CURABLE COMPOUNDS SUCH AS BIS(ACRYLATED ALKOXY)SPIROBIINDANS; ALSO POLYAMIDES AND POLYIMIDES CONTAINING SPIROBIINDAN GROUPS MITSUI CHEMICALS, INC. (JP) 2000-06-27 US disclosed
EP-0822545-A2 Optical component and spirobiindan polymer therefor MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1998-02-04 EP disclosed
EP-0473780-B1 ANTIFOG SHEET AND METHOD OF ITS PRODUCTION DAINIPPON PRINTING CO LTD (JP) 1994-11-30 EP disclosed
US-5273812-A Forming a film by rolling a sovent-free composition of polymer, hydrophilic monomer and surfactant; crosslinking by ionizing radiation DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) 1993-12-28 US disclosed
EP-0473780-A1 ANTIFOG SHEET AND METHOD OF ITS PRODUCTION DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) 1992-03-11 EP disclosed