SCHEMBL486784

SCHEMBL486784

CC(C)(c1ccc(Oc2cccc(N3C(=O)C=CC3=O)c2)cc1)c1cccc(C(C)(C)c2ccc(Oc3cccc(N4C(=O)C=CC4=O)c3)cc2)c1

nearest known ligand 0.54

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 12/20 0.54
FAAH O00519 4/20 0.47
HSP90AA1 P07900 3/20 0.45
ALDH1A1 P00352 1/20 0.41
PKM P14618 1/20 0.41
HTT P42858 1/20 0.41
ATM Q13315 1/20 0.41
ESR1 P03372 1/20 0.41
ESR2 Q92731 1/20 0.41
NPC1 O15118 1/20 0.40
POLB P06746 1/20 0.40
CYP2C9 P11712 1/20 0.40
RAB9A P51151 1/20 0.40
HPN P05981 1/20 0.38
ADAMTS5 Q9UNA0 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29573130 1.00 MGLL (0.54) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL487163 0.96 MGLL (0.58) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL486609 0.96 MGLL (0.58) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL29573306 0.96 MGLL (0.58) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL30158445 0.96 MGLL (0.58) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL11940262 0.92 MGLL (0.59) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL487831 0.92 MGLL (0.58) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL20913148 0.89 MGLL (0.62) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL1156245 0.85 MGLL (0.60) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL29573295 0.84 MGLL (0.51) MGLLFAAHHSP90AA1ALDH1A1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5484948-A FOR MANUFACTURING POLYIMIDES MITSUI TOATSU CHEMICALS, INC. (JP) 1996-01-16 US claimed
EP-0425265-B1 Aromatic diamine compounds, bismaleimide compounds, thermosetting resins forming compositions therefrom, resins therefrom, and methods for their preparation MITSUI TOATSU CHEMICALS (JP) 1994-08-03 EP claimed
EP-0425265-A1 Aromatic diamine compounds, bismaleimide compounds, thermosetting resins forming compositions therefrom, resins therefrom, and methods for their preparation MITSUI TOATSU CHEMICALS, Inc. (JP) 1991-05-02 EP claimed
WO-2024150769-A1 WIRING FORMING MEMBER, METHOD FOR FORMING WIRING LAYER, AND WIRING FORMED MEMBER 株式会社レゾナック 2024-07-18 WO disclosed
EP-4394000-A1 THERMOSETTING RESIN COMPOSITION AND HEAT CURED PRODUCT Polyplastics-Evonik Corporation (JP) 2024-07-03 EP disclosed
EP-4368674-A1 RESIN COMPOSITION, RESIN FILM, PRINTED WIRING BOARD, AND SEMICONDUCTOR PACKAGE Resonac Corporation (JP) 2024-05-15 EP disclosed
WO-2024080195-A1 PREPREG, LAMINATED PLATE, PRINTED WIRING BOARD, AND SEMICONDUCTOR PACKAGE 株式会社レゾナック 2024-04-18 WO disclosed
US-20240092958-A1 THERMOSETTING RESIN COMPOSITION, PREPREG, LAMINATE, METAL-CLAD LAMINATE, PRINTED WIRING BOARD, AND HIGH-SPEED COMMUNICATION COMPATIBLE MODULE RESONAC CORPORATION (JP) 2024-03-21 US disclosed
US-20230391939-A1 RESIN COMPOSITION, PREPREG, LAMINATED PLATE, RESIN FILM, PRINTED WIRING BOARD, AND SEMICONDUCTOR PACKAGE RESONAC CORPORATION (JP) 2023-12-07 US disclosed
WO-2023224021-A1 RESIN COMPOSITION, PREPREG, LAMINATE, RESIN FILM, PRINTED WIRING BOARD AND SEMICONDUCTOR PACKAGE 株式会社レゾナック 2023-11-23 WO disclosed
WO-2023163086-A1 RESIN COMPOSITION, PREPREG, LAMINATED BOARD, RESIN FILM, PRINTED WIRING BOARD, AND SEMICONDUCTOR PACKAGE 株式会社レゾナック 2023-08-31 WO disclosed
US-20120077401-A1 RESIN COMPOSITION FOR PRODUCTION OF CLAD LAYER, RESIN FILM FOR PRODUCTION OF CLAD LAYER UTILIZING THE RESIN COMPOSITION, AND OPTICAL WAVEGUIDE AND OPTICAL MODULE EACH UTILIZING THE RESIN COMPOSITION OR THE RESIN FILM HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-03-29 US disclosed
EP-2412743-A1 THERMOSETTING RESIN COMPOSITION, AND PREPREG, INSULATING FILM WITH SUPPORT, LAMINATE PLATE, AND PRINTED WIRING BOARD, EACH OBTAINED USING SAME Hitachi Chemical Company, Ltd. (JP) 2012-02-01 EP disclosed
US-5525704-A AROMATIC THERMOSETTING RESIN COMPRISING AROMATIC DIAMINE AND BISMALEIMIDE MONOMERS; FLEXIBILITY, WORKABILITY AND MOLDABILITY MITSUI TOATSU CHEMICALS, INC. (JP) 1996-06-11 US disclosed
US-5484948-A FOR MANUFACTURING POLYIMIDES MITSUI TOATSU CHEMICALS, INC. (JP) 1996-01-16 US disclosed
US-5364967-A Addition-type polyimides, flexibility, solubility MITSUI TOATSU CHEMICALS, INC. (JP) 1994-11-15 US disclosed
EP-0451404-B1 Thermosetting resin forming compositions and process for preparing the same MITSUI TOATSU CHEMICALS (JP) 1994-09-21 EP disclosed
EP-0425265-B1 Aromatic diamine compounds, bismaleimide compounds, thermosetting resins forming compositions therefrom, resins therefrom, and methods for their preparation MITSUI TOATSU CHEMICALS (JP) 1994-08-03 EP disclosed
US-5206438-A AROMATIC DIAMINE COMPOUNDS, BISMALEIMIDE COMPOUNDS, THERMOSETTING RESIN FORMING COMPOSITIONS THEREFROM, RESINS THEREFROM, AND METHODS FOR THEIR PREPARATION MITSUI TOATSU CHEMICALS, INC. (JP) 1993-04-27 US disclosed
EP-0425265-A1 Aromatic diamine compounds, bismaleimide compounds, thermosetting resins forming compositions therefrom, resins therefrom, and methods for their preparation MITSUI TOATSU CHEMICALS, Inc. (JP) 1991-05-02 EP disclosed