Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.41 |
| ▸ | MAOB | P27338 | 4/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | MAOA | P21397 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | HTR2A | P28223 | 3/20 | 0.40 |
| ▸ | HRH1 | P35367 | 3/20 | 0.40 |
| ▸ | CNR2 | P34972 | 2/20 | 0.40 |
| ▸ | CNR1 | P21554 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3049115 | 0.89 | HTR2A (0.46) | TSHRTDP1MAOBCYP3A4MAOA | |
| Benzene SCHEMBL28278798 | 0.89 | TSHR (0.41) | TSHRTDP1MAOBCYP3A4MAOA | |
| SCHEMBL48724 | 0.86 | MAPT (0.42) | TSHRTDP1MAOBCYP3A4MAOA | |
| SCHEMBL2914007 | 0.86 | MAPT (0.42) | TSHRTDP1MAOBCYP3A4MAOA | |
| SCHEMBL8100164 | 0.86 | MAPT (0.42) | TSHRTDP1MAOBCYP3A4MAOA | |
| SCHEMBL10454608 | 0.85 | CYP3A4 (0.42) | TSHRTDP1MAOBCYP3A4MAOA | |
| SCHEMBL11205377 | 0.84 | HTR2A (0.54) | TSHRTDP1CYP3A4CYP1A2CYP2C9 | |
| Toluene SCHEMBL28231736 | 0.83 | ACHE (0.46) | TSHRTDP1MAOBCYP3A4MAOA | |
| SCHEMBL28334382 | 0.80 | TDP1 (0.50) | TSHRTDP1CYP3A4KDM4EALDH1A1 | |
| SCHEMBL9723229 | 0.79 | CYP3A4 (0.48) | TSHRTDP1MAOBCYP3A4MAOA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117510845-B | Liquid crystal aligning agent with high pretilt angle and application thereof | 波米科技有限公司 | 2024-06-25 | — | — | CN | disclosed |
| CN-113912847-B | Polymer, liquid crystal aligning agent, liquid crystal alignment film and application of liquid crystal alignment film | 波米科技有限公司 | 2024-06-18 | — | — | CN | disclosed |
| EP-4372035-A1 | POROUS POLYIMIDE HAVING HIGHLY UNIFORM NANO STRUCTURE | Asahi Kasei Kabushiki Kaisha (JP) | 2024-05-22 | — | — | EP | disclosed |
| CN-113292853-B | Resin composition, polyimide resin film, and method for producing same | 旭化成株式会社 | 2024-04-05 | — | — | CN | disclosed |
| CN-117616075-A | Porous polyimide having nanostructure with high uniformity | 旭化成株式会社 | 2024-02-27 | — | — | CN | disclosed |
| CN-117510845-A | Liquid crystal aligning agent with high pretilt angle and application thereof | 波米科技有限公司 | 2024-02-06 | — | — | CN | disclosed |
| CN-115141372-B | Polyimide substance and application thereof | 波米科技有限公司 | 2024-01-26 | — | — | CN | disclosed |
| CN-112080026-B | Polyimide film having voids and method for producing same | 旭化成株式会社 | 2024-01-23 | — | — | CN | disclosed |
| US-11702565-B2 | Polyimide varnish and method for producing same | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-07-18 | — | — | US | disclosed |
| CN-111892708-B | Resin precursor, resin composition containing the same, resin film and method for producing the same, and laminate and method for producing the same | 旭化成株式会社 | 2023-06-13 | — | — | CN | disclosed |
| US-20090267239-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | ASAHI KASEI EMD CORPORATION (JP) | 2009-10-29 | — | — | US | disclosed |
| EP-2056406-A1 | CIRCUIT CONNECTING MATERIAL, CONNECTION STRUCTURE FOR CIRCUIT MEMBER USING THE SAME AND PRODUCTION METHOD THEREOF | Hitachi Chemical Company, Ltd. (JP) | 2009-05-06 | — | — | EP | disclosed |
| EP-1923742-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | Asahi Kasei EMD Corporation (JP) | 2008-05-21 | — | — | EP | disclosed |
| EP-1262509-B1 | IMIDE-BENZOXAZOLE POLYCONDENSATE AND PROCESS FOR PRODUCING THE SAME | PI R & D CO LTD (JP) | 2007-01-10 | — | — | EP | disclosed |
| US-6890626-B1 | Imide-benzoxazole polycondensate and process for producing the same | PI R&D CO., LTD. (JP) | 2005-05-10 | — | — | US | disclosed |
| EP-1123954-B1 | COMPOSITION FOR POLYIMIDE ELECTRODEPOSITION AND METHOD OF FORMING PATTERNED POLYIMIDE FILM WITH THE SAME | PI R & D CO LTD (JP) | 2005-04-13 | — | — | EP | disclosed |
| US-6630064-B1 | Electro-depositing polyimide membranes which can be patterned by photolithography, which are excellent in heat resistance, insulation performance and in chemical resistance, photoacid generator, a positive-type photosensitive polyimide | PI R&D CO., LTD. (JP) | 2003-10-07 | — | — | US | disclosed |
| EP-1262509-A1 | IMIDE-BENZOXAZOLE POLYCONDENSATE AND PROCESS FOR PRODUCING THE SAME | PI R & D Co., Ltd. (JP) | 2002-12-04 | — | — | EP | disclosed |
| EP-1209184-A1 | PHOTOSENSITIVE LOW-PERMITTIVITY POLYIMIDE AND METHOD OF FORMING POSITIVE POLYIMIDE FILM PATTERN FROM THE SAME | PI R & D Co., Ltd. (JP) | 2002-05-29 | — | — | EP | disclosed |
| EP-1123954-A1 | COMPOSITION FOR POLYIMIDE ELECTRODEPOSITION AND METHOD OF FORMING PATTERNED POLYIMIDE FILM WITH THE SAME | PI R & D Co., Ltd. (JP) | 2001-08-16 | — | — | EP | disclosed |