Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.30 |
| ▸ | CPN1 | P15169 | 1/20 | 0.30 |
| ▸ | CPB2 | Q96IY4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5497752 | 0.87 | HRH3 (0.31) | HRH3CPN1CPB2 | |
| SCHEMBL31458641 | 0.79 | GNAO1 (0.36) | HRH3CPN1CPB2 | |
| SCHEMBL357186 | 0.73 | — | — | |
| SCHEMBL31458643 | 0.71 | GNAO1 (0.34) | HRH3CPN1CPB2 | |
| SCHEMBL11302107 | 0.71 | DPP4 (0.41) | HRH3CPN1CPB2 | |
| SCHEMBL2091404 | 0.69 | HRH3 (0.42) | HRH3 | |
| SCHEMBL25290171 | 0.68 | CYP1A2 (0.33) | — | |
| SCHEMBL60981 | 0.67 | — | — | |
| SCHEMBL8436215 | 0.67 | CPN1 (0.35) | CPN1CPB2 | |
| SCHEMBL104444 | 0.67 | GNAO1 (0.37) | HRH3CPN1CPB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080035556-A1 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | PADMANABAN MUNIRATHNA | 2008-02-14 | — | — | US | claimed |
| US-20060102554-A1 | Process for producing film forming resins for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2006-05-18 | — | — | US | claimed |
| US-20080035556-A1 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | PADMANABAN MUNIRATHNA | 2008-02-14 | — | — | US | disclosed |
| US-20060102554-A1 | Process for producing film forming resins for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2006-05-18 | — | — | US | disclosed |