Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9624072 | 0.81 | GSTP1 (0.30) | GSTP1 | |
| SCHEMBL15161781 | 0.78 | TBXAS1 (0.36) | GSTP1TBXAS1 | |
| SCHEMBL15665963 | 0.74 | GSTP1 (0.31) | GSTP1 | |
| SCHEMBL29010382 | 0.73 | GSTP1 (0.43) | GSTP1TBXAS1 | |
| SCHEMBL4872196 | 0.73 | TSHR (0.46) | GSTP1 | |
| SCHEMBL11213825 | 0.71 | — | — | |
| SCHEMBL10945793 | 0.71 | TBXAS1 (0.32) | TBXAS1 | |
| SCHEMBL3421769 | 0.71 | TSHR (0.43) | GSTP1TBXAS1 | |
| SCHEMBL4872198 | 0.71 | TSHR (0.33) | — | |
| SCHEMBL29010386 | 0.70 | HCAR2 (0.41) | GSTP1TBXAS1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7364833-B2 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG ELECTRONICS CO., LTD (KR) | 2008-04-29 | — | — | US | claimed |
| US-20050266339-A1 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG DISPLAY CO., LTD. (KR) | 2005-12-01 | — | — | US | claimed |
| WO-2004107053-A1 | POSITIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | claimed |
| WO-2004107052-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | claimed |
| WO-2004097522-A1 | NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD | ADMS TECHNOLOGY CO. LTD. (KR) | 2004-11-11 | — | — | WO | claimed |
| US-4388434-A | ACRYLIC ESTER POLYMERS | ROHM AND HAAS COMPANY (US) | 1983-06-14 | — | — | US | claimed |
| CN-113423789-B | Stabilized printing material | 科迪华公司 | 2023-04-07 | — | — | CN | disclosed |
| CN-114502671-A | Clear coating composition | 株式会社KCC | 2022-05-13 | — | — | CN | disclosed |
| CN-113423789-A | Stabilized printing material | 科迪华公司 | 2021-09-21 | — | — | CN | disclosed |
| US-9897729-B2 | Photosensitive resin composition for color filter and application thereof | CHI MEI CORPORATION (TW) | 2018-02-20 | — | — | US | disclosed |
| US-20150315376-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2015-11-05 | — | — | US | disclosed |
| CN-100538517-C | Negative resist composition for organic insulating layer of high aperture LCD | ADMS TECHNOLOGY CO LTD (KR) | 2009-09-09 | — | — | CN | disclosed |
| US-7364833-B2 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG ELECTRONICS CO., LTD (KR) | 2008-04-29 | — | — | US | disclosed |
| EP-0618244-A2 | Multiple curable composition and use thereof | W.R. GRACE & CO.-CONN. (US) | 1994-10-05 | — | — | EP | disclosed |
| US-5234970-A | Conformal coatings | W. R. GRACE & CO.-CONN. (US) | 1993-08-10 | — | — | US | disclosed |
| EP-0549116-A2 | Dual curing composition and use thereof | W.R. Grace & Co.-Conn. (US) | 1993-06-30 | — | — | EP | disclosed |
| US-4388434-A | ACRYLIC ESTER POLYMERS | ROHM AND HAAS COMPANY (US) | 1983-06-14 | — | — | US | disclosed |
| US-4255196-A | A CURABLE DILUENT DESCRIBED AS THE MIXED ESTERS OF A POLYOL WITH MIXED NATURAL DRYING OIL FATTY ACIDS AND AN UNSATURATED ACYCLIC ACID | ROHM AND HAAS COMPANY (US) | 1981-03-10 | — | — | US | disclosed |
| US-4253397-A | COMPRISING A CURABLE LIQUID REACTIVE DILUENT WHICH IS A POLYUNSATURATED ESTER | ROHM AND HAAS COMPANY (US) | 1981-03-03 | — | — | US | disclosed |
| EP-0015147-A1 | Lithographic ink containing oxidatively curable reactive diluent and use thereof | ROHM AND HAAS COMPANY (US) | 1980-09-03 | — | — | EP | disclosed |