SCHEMBL48891

SCHEMBL48891

CO[Si](CCCNCCNCC(=O)O)(OC)OC

nearest known ligand 0.37

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
EGLN1 Q9GZT9 2/20 0.37
TSHR P16473 1/20 0.34
LTA4H P09960 1/20 0.34
PAOX Q6QHF9 1/20 0.32
ADRA1A P35348 1/20 0.32
CA3 P07451 1/20 0.32
CA5A P35218 1/20 0.32
CA5B Q9Y2D0 1/20 0.32
MAOA P21397 1/20 0.31
MAOB P27338 1/20 0.31
CA1 P00915 4/20 0.31
CA2 P00918 4/20 0.31
POLB P06746 2/20 0.31
MAPK1 P28482 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2487654 0.96 EGLN1 (0.39) EGLN1TSHRLTA4HADRA1AMAOA
SCHEMBL139047 0.89 TSHR (0.42) TSHRADRA1APOLBMAPK1SMN1; SMN2
SCHEMBL2486025 0.88 PRMT1 (0.42) EGLN1ADRA1A
SCHEMBL2483730 0.87 TSHR (0.39) TSHRLTA4HADRA1APOLBMAPK1
SCHEMBL22229464 0.86 RECQL (0.40) TSHRPAOXCA3CA5ACA5B
SCHEMBL17374807 0.84 MAOA (0.46) PAOXCA3CA5ACA5BMAOA
Succinic Acid SCHEMBL8153802 0.83 PAOX (0.39) TSHRPAOXADRA1ACA3CA5A
SCHEMBL1931026 0.82 LMNA (0.38) TSHRCA3CA5ACA5BCA1
SCHEMBL29534835 0.82 LMNA (0.38) TSHRCA3CA5ACA5BCA1
SCHEMBL48137 0.82 LMNA (0.38) TSHRCA3CA5ACA5BCA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 542 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4647402-A ORGANOSILICON MONOMER, ELECTROCONDUCTIVE POWDER, EPOXY RESIN ADHESIVE CANON KABUSHIKI KAISHA (JP) 1987-03-03 US claimed
US-4587038-A SILANE COUPLER CANON KABUSHIKI KAISHA (JP) 1986-05-06 US claimed
US-12037461-B2 Encapped curable polyorganosiloxanes HENKEL AG & CO. KGAA (DE) 2024-07-16 US disclosed
US-20240228817-A9 CURABLE COMPOSITION, CURED PRODUCT, COATING AGENT, AND CONCRETE STRUCTURE KANEKA CORPORATION (JP) 2024-07-11 US disclosed
CN-118222271-A Dispersion, composition containing the same, and light conversion layer DIC株式会社 2024-06-21 CN disclosed
CN-118222273-A Luminescent powder and method for producing same, ink composition, light conversion layer, color filter, wavelength conversion film, and method for adjusting peak wavelength DIC株式会社 2024-06-21 CN disclosed
CN-118222272-A Dispersion, ink composition containing the same, and light conversion layer DIC株式会社 2024-06-21 CN disclosed
US-20240132743-A1 CURABLE COMPOSITION, CURED PRODUCT, COATING AGENT, AND CONCRETE STRUCTURE KANEKA CORPORATION (JP) 2024-04-25 US disclosed
US-20240110043-A1 STABILIZER COMPOSITION FOR SILYL-MODIFIED POLYMER SEALANTS CLARIANT INTERNATIONAL LTD. (CH) 2024-04-04 US disclosed
WO-2024056507-A1 CURABLE SILICONE COMPOSITIONS CONTAINING ADDITIVES HENKEL AG & CO. KGAA (DE) 2024-03-21 WO disclosed
EP-4339217-A1 CURABLE SILICONE COMPOSITIONS CONTAINING ADDITIVES Henkel AG & Co. KGaA (DE) 2024-03-20 EP disclosed
EP-1134251-A1 Primer composition Kaneka Corporation (JP) 2001-09-19 EP disclosed
EP-0693513-B1 Process for purifying a polyether ASAHI GLASS CO LTD (JP) 2001-01-10 EP disclosed
EP-1004628-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2000-05-31 EP disclosed
US-6020446-A Curable composition KANEKA CORPORATION (JP) 2000-02-01 US disclosed
US-5973096-A A CURABLE POLYETHER CONTAINING A HYDROLYZABLE AND SILICON GROUPS WITH IONIC IMPURITIES ASAHI GLASS COMPANY LTD. (JP) 1999-10-26 US disclosed
EP-0934956-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 1999-08-11 EP disclosed
EP-0931821-A2 Primer composition and method of effecting adhesion for sealing compositions KANEKA CORPORATION (JP) 1999-07-28 EP disclosed
US-5811566-A TREATING POLYETHER HAVING UNSATURATED END GROUPS WITH AN ACID WHICH WILL REACT WITH SALT IMPURITIES, ADDING WATER, SURFACTANT AND ADSORBER, FILTRATION, FOR REMOVING CATALYST RESIDUES ASAHI GLASS COMPANY LTD. (JP) 1998-09-22 US disclosed
EP-0693513-A2 Process for purifying a polyether ASAHI GLASS COMPANY LTD. (JP) 1996-01-24 EP disclosed