Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 5/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | CASP1 | P29466 | 1/20 | 0.47 |
| ▸ | CASP7 | P55210 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.39 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 5/20 | 0.38 |
| ▸ | PDE7A | Q13946 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 3/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formaldehyde SCHEMBL1304273 | 0.93 | CYP3A4 (0.41) | CYP3A4ALOX15SMN1; SMN2CASP1CASP7 | |
| SCHEMBL10582985 | 0.91 | CYP3A4 (0.39) | CYP3A4ALOX15SMN1; SMN2CASP1CASP7 | |
| Sulfuric Acid SCHEMBL3643901 | 0.87 | GAA (0.40) | CYP3A4ALOX15SMN1; SMN2CASP1CASP7 | |
| Formaldehyde SCHEMBL11317941 | 0.76 | TSHR (0.52) | SMN1; SMN2ALDH1A1L3MBTL1TDP1TSHR | |
| Paraben SCHEMBL8014039 | 0.76 | CA2 (0.52) | TSHRMAPTMEN1KMT2ARAB9A | |
| SCHEMBL6697024 | 0.74 | ALDH1A1 (0.57) | CYP3A4SMN1; SMN2ALDH1A1L3MBTL1TDP1 | |
| SCHEMBL6691425 | 0.73 | ALDH1A1 (0.50) | CYP3A4SMN1; SMN2ALDH1A1L3MBTL1TDP1 | |
| SCHEMBL14115174 | 0.70 | CYP3A4 (0.45) | CYP3A4ALOX15SMN1; SMN2CASP1CASP7 | |
| SCHEMBL14115151 | 0.69 | CYP3A4 (0.43) | CYP3A4ALOX15SMN1; SMN2CASP1CASP7 | |
| SCHEMBL11911292 | 0.69 | ALOX15 (0.43) | CYP3A4ALOX15SMN1; SMN2CASP1CASP7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 467 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0554006-B1 | Polyunsaturated diazonium compounds | AGFA GEVAERT NV (BE) | 1999-04-28 | — | — | EP | claimed |
| EP-0327341-B1 | Improvements in or relating to radiation-sensitive compositions | DU PONT (US) | 1994-07-20 | — | — | EP | claimed |
| EP-0277722-B1 | FORMATION METHOD AND PHOTORESIST COMPOSITION FOR PHOSPHOR SCREENS OF COLOUR PICTURE TUBES | KABUSHIKI KAISHA TOSHIBA (JP) | 1993-09-08 | — | — | EP | claimed |
| EP-0415422-A2 | Method for forming images | FUJI PHOTO FILM CO., LTD. (JP) | 1991-03-06 | — | — | EP | claimed |
| EP-0399755-A1 | Light-sensitive composition and presensitized plate for use in making lithographic printing plates | Fuji Photo Film Co., Ltd. (JP) | 1990-11-28 | — | — | EP | claimed |
| US-4954418-A | PHOSPHATE OF A FORMALIN CONDENSATE OF DIAZODIPHENYLAMINE; 2,5-BIS(4'-AZIDE-2'-SULPHOBENZILIDENE)CYCLOPENTANONE SODIUM SALT, POLYVINYL ALCOHOL AND POLYVINYLPYRROLIDONE | KABUSHIKI KAISHA TOSHIBA (JP) | 1990-09-04 | — | — | US | claimed |
| US-4857428-A | IMPROVED SENSITIVITY | KABUSHIKI KAISHA TOSHIBA (JP) | 1989-08-15 | — | — | US | claimed |
| EP-0024872-B2 | A METHOD OF TREATING EXPOSED AND DEVELOPED RADIATION SENSITIVE PLATES IN LITHOGRAPHIC PRINTING PLATE PRODUCTION, COMPOSITIONS FOR USE IN THE METHOD, AND THE USE OF DIAZO ELIMINATING COMPOUNDS IN IMPROVING THE INK RECEPTIVITY OF LITHOGRAPHIC PRINTING IMAGES | Vickers Limited (GB) | 1988-12-07 | — | — | EP | claimed |
| EP-0277722-A2 | Formation method and photoresist composition for phosphor screens of colour picture tubes | KABUSHIKI KAISHA TOSHIBA (JP) | 1988-08-10 | — | — | EP | claimed |
| US-4737436-A | Water based method for making color proof images on single substrate with blend of pigment for each color in photoresist | GRAFMARK INTERNATIONAL LIMITED (GB) | 1988-04-12 | — | — | US | claimed |
| EP-0182605-A2 | Photo mechanical imaging | GRAFMARK INTERNATIONAL LIMITED (GB) | 1986-05-28 | — | — | EP | claimed |
| US-4501806-A | PHOTOCURING, DEVELOPMENT OF WATER SOLUBLE BISAZIDOCOMPOUND, DIAZOCOMPOUND AND POLYMER | TOKYO SHIBAURA DENKI KABUSHIKI KAISHA (JP) | 1985-02-26 | — | — | US | claimed |
| EP-0024872-B1 | A METHOD OF TREATING EXPOSED AND DEVELOPED RADIATION SENSITIVE PLATES IN LITHOGRAPHIC PRINTING PLATE PRODUCTION, COMPOSITIONS FOR USE IN THE METHOD, AND THE USE OF DIAZO ELIMINATING COMPOUNDS IN IMPROVING THE INK RECEPTIVITY OF LITHOGRAPHIC PRINTING IMAGES | Vickers Limited (GB) | 1984-03-14 | — | — | EP | claimed |
| US-4154614-A | ACRYLONITRILE-HYDROLYSED POLYVINYL ACETATE GRAFT POLYMER | NIPPON PAINT CO., LTD. (JP) | 1979-05-15 | — | — | US | claimed |
| JP-60104940-A | — | — | None | — | — | JP | disclosed |
| JP-10123705-A | — | — | None | — | — | JP | disclosed |
| JP-3192259-A | — | — | None | — | — | JP | disclosed |
| US-4210711-A | Process for forming an image | FUJI PHOTO FILM CO., LTD. (JP) | 1980-07-01 | — | — | US | disclosed |
| US-4152158-A | Electrochemically treated photo-lithographic plates | POLYCHROME CORPORATION (US) | 1979-05-01 | — | — | US | disclosed |
| US-4144067-A | DIAZO RESIN, FISH GLUE BINDER | HOECHST AKTIENGESELLSCHAFT (DE) | 1979-03-13 | — | — | US | disclosed |