⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methylene Chloride SCHEMBL5323529 | 0.82 | — | — | |
| SCHEMBL8696403 | 0.72 | — | — | |
| SCHEMBL15954717 | 0.72 | — | — | |
| SCHEMBL8696367 | 0.72 | — | — | |
| SCHEMBL331442 | 0.72 | — | — | |
| SCHEMBL867025 | 0.72 | — | — | |
| SCHEMBL8962403 | 0.65 | — | — | |
| SCHEMBL233695 | 0.61 | — | — | |
| Chloroform SCHEMBL11043408 | 0.61 | LMNA (1.00) | — | |
| Chloroform SCHEMBL2084455 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2529 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026101630-A1 | METHODS OF SELECTIVELY ETCHING SILICON | APPLIED MATERIALS, INC. (US) | 2026-05-15 | — | — | WO | claimed |
| EP-4077339-B1 | CATALYST PARTICLES AND METHODS FOR DEHYDROGENATIVE SILYLATION | DOW SILICONES CORP (US) | 2026-05-13 | — | — | EP | claimed |
| US-20260130144-A1 | METHODS OF SELECTIVELY ETCHING SILICON | APPLIED MATERIALS, INC. (US) | 2026-05-07 | — | — | US | claimed |
| EP-4474064-B1 | FIN AND TUBE TYPE AND MICROCHANNEL TYPE HEAT EXCHANGERS AND MANUFACTURING METHOD THEREOF. | LG ELECTRONICS INC (KR) | 2026-04-29 | — | — | EP | claimed |
| US-12612422-B2 | Method for making a siloxane-(meth)acrylate macromonomer | DOW SILICONES CORPORATION (US) | 2026-04-28 | — | — | US | claimed |
| US-12518963-B2 | Composition for depositing silicon-containing thin film and method for manufacturing silicon-containing thin film using the same | DNF CO., LTD. (KR) | 2026-01-06 | — | — | US | claimed |
| EP-3819301-B1 | PREPARATION OF ORGANOSILICON COMPOUND HAVING (METH)ACRYLOYLOXY GROUP | SHINETSU CHEMICAL CO (JP) | 2025-08-06 | — | — | EP | claimed |
| US-12371446-B2 | Catalyst particles and methods for dehydrogenative silylation | DOW SILICONES CORPORATION (US) | 2025-07-29 | — | — | US | claimed |
| CN-120058373-A | Silicon carbide-based ceramic material, preparation method thereof and large-size silicon carbide ceramic furnace tube | 沈阳星光技术陶瓷有限公司 | 2025-05-30 | — | — | CN | claimed |
| US-20250155207-A1 | COMPOSITE COATING FILM, HEAT EXCHANGER COMPRISING SAME, AND METHOD FOR MANUFACTURING HEAT EXCHANGER | LG ELECTRONICS INC. (KR) | 2025-05-15 | — | — | US | claimed |
| EP-0355800-A1 | Process for the preparation of aryl-dimethyl-3-arylpropyl-silanes | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-02-28 | — | — | EP | claimed |
| US-4870200-A | Process for preparing disproportionation products of dichloromethylsilane in the presence of a catalyst | WACKER-CHEMIE GMBH (DE) | 1989-09-26 | — | — | US | claimed |
| US-4824657-A | Process for reducing silicon, germanium and tin halides | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-04-25 | — | — | US | claimed |
| EP-0286074-A2 | Process for the preparation of products resulting from the disproportionation of dichloromethylsilan in presence of a catalyst | WACKER-CHEMIE GMBH (DE) | 1988-10-12 | — | — | EP | claimed |
| EP-0274757-A2 | Bilayer lithographic process | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1988-07-20 | — | — | EP | claimed |
| EP-0260103-A1 | Moisture-curable low molecular weight polymers and compositions and composites thereof | UNIROYAL CHEMICAL COMPANY, Inc. (US) | 1988-03-16 | — | — | EP | claimed |
| EP-0255132-A2 | Method of making ceramic fibres containing silicon carbide | Wacker-Chemie GmbH (DE) | 1988-02-03 | — | — | EP | claimed |
| US-4678768-A | POLYMERS OF HIGH STEREOREGULARITY AND BULK DENSITY | TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) | 1987-07-07 | — | — | US | claimed |
| US-4474976-A | ARYLATION | GENERAL ELECTRIC COMPANY (US) | 1984-10-02 | — | — | US | claimed |
| US-3983148-A | Process for producing cyclic siloxanes | UNION CARBIDE CORPORATION (US) | 1976-09-28 | — | — | US | claimed |