SCHEMBL4897575

SCHEMBL4897575

O=S(=O)(ON=C(c1ccccc1)C(F)(F)S(=O)(=O)C1CCCCC1)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
ALOX15 P16050 1/20 0.33
QRFPR Q96P65 1/20 0.33
POLB P06746 1/20 0.31
ELANE P08246 1/20 0.31
ELOVL6 Q9H5J4 1/20 0.31
ALDH1A1 P00352 1/20 0.30
RECQL P46063 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4903505 0.89 MEN1 (0.33) MEN1KMT2AALOX15QRFPRPOLB
SCHEMBL4901474 0.87 QRFPR (0.34) MEN1KMT2AALOX15QRFPRALDH1A1
SCHEMBL4903534 0.84 ENPP3 (0.34) MEN1KMT2AALOX15QRFPRALDH1A1
SCHEMBL6881581 0.83 ALOX15 (0.36) MEN1KMT2AALOX15QRFPRELOVL6
SCHEMBL10150705 0.82 ALOX15 (0.36) MEN1KMT2AALOX15QRFPRELOVL6
SCHEMBL4897641 0.77 KMT2A (0.36) MEN1KMT2AALDH1A1NPSR1
SCHEMBL12293171 0.76 CES1 (0.41) MEN1KMT2AALOX15ALDH1A1NPSR1
SCHEMBL16593512 0.76 CES1 (0.41) MEN1KMT2AALOX15ALDH1A1NPSR1
SCHEMBL6878670 0.76 CES1 (0.46) MEN1KMT2AALOX15POLBELANE
SCHEMBL4901366 0.74 QRFPR (0.35) MEN1KMT2AQRFPRPOLBELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US claimed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US claimed
US-20080187859-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2008-08-07 US disclosed
US-20070269735-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2007-11-22 US disclosed
US-7297461-B2 Radiation sensitive resin composition JSR CORPORATION (JP) 2007-11-20 US disclosed
EP-1736829-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-12-27 EP disclosed
EP-1726608-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-11-29 EP disclosed
US-20050171226-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2005-08-04 US disclosed
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US disclosed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US disclosed