SCHEMBL4903534

SCHEMBL4903534

CCCS(=O)(=O)ON=C(c1ccccc1)C(F)(F)S(=O)(=O)C1CCCCC1

nearest known ligand 0.34

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ENPP3 O14638 1/20 0.34
ENPP1 P22413 1/20 0.34
ENPP2 Q13822 1/20 0.34
LMNA P02545 2/20 0.34
SLC6A9 P48067 2/20 0.32
QRFPR Q96P65 1/20 0.32
KDM4E B2RXH2 1/20 0.30
ALDH1A1 P00352 1/20 0.30
MEN1 O00255 2/20 0.30
KMT2A Q03164 2/20 0.30
CYP1A2 P05177 1/20 0.30
CYP2D6 P10635 1/20 0.30
SCN1A P35498 1/20 0.30
SCN2A Q99250 1/20 0.30
SCN3A Q9NY46 1/20 0.30
ALOX15 P16050 1/20 0.30
NR5A2 O00482 1/20 0.30
NR5A1 Q13285 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4901474 0.92 QRFPR (0.34) ENPP3ENPP1ENPP2LMNAQRFPR
SCHEMBL4903505 0.85 MEN1 (0.33) LMNAQRFPRKDM4EALDH1A1MEN1
SCHEMBL4897575 0.84 MEN1 (0.33) QRFPRALDH1A1MEN1KMT2AALOX15
SCHEMBL4903140 0.82 NPSR1 (0.34) LMNAALDH1A1MEN1KMT2A
SCHEMBL4895537 0.80 TDP1 (0.35) ALDH1A1MEN1KMT2A
SCHEMBL10150705 0.79 ALOX15 (0.36) QRFPRKDM4EALDH1A1MEN1KMT2A
SCHEMBL4901776 0.78 NPSR1 (0.34) LMNAALDH1A1MEN1KMT2A
SCHEMBL6881581 0.77 ALOX15 (0.36) QRFPRALDH1A1MEN1KMT2AALOX15
SCHEMBL775942 0.76 ELANE (0.34) LMNAQRFPRALDH1A1MEN1KMT2A
SCHEMBL4903440 0.75 MAPT (0.34) LMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US claimed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US claimed
US-20080187859-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2008-08-07 US disclosed
US-20070269735-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2007-11-22 US disclosed
US-7297461-B2 Radiation sensitive resin composition JSR CORPORATION (JP) 2007-11-20 US disclosed
EP-1736829-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-12-27 EP disclosed
EP-1726608-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-11-29 EP disclosed
US-20050171226-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2005-08-04 US disclosed
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US disclosed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US disclosed