SCHEMBL489807

SCHEMBL489807

CCCCN([C]=O)c1ccccc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.44
ESR1 P03372 1/20 0.43
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
NPSR1 Q6W5P4 1/20 0.42
NPC1 O15118 1/20 0.41
JAK2 O60674 1/20 0.41
RAB9A P51151 1/20 0.41
PAX8 Q06710 1/20 0.41
TP53 P04637 1/20 0.41
HDAC1 Q13547 1/20 0.40
HDAC6 Q9UBN7 1/20 0.40
CASP1 P29466 1/20 0.39
BRCA1 P38398 1/20 0.39
CASP7 P55210 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
HSD17B10 Q99714 1/20 0.39
KCNH2 Q12809 1/20 0.39
ELANE P08246 1/20 0.39
GAA P10253 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704306 0.94 NPC1 (0.47) TDP1ESR1MEN1KMT2ANPSR1
SCHEMBL707049 0.93 NPC1 (0.50) TDP1NPC1JAK2RAB9APAX8
SCHEMBL15352674 0.93 NPC1 (0.50) TDP1NPC1JAK2RAB9APAX8
SCHEMBL16414652 0.93 NPC1 (0.50) TDP1NPC1JAK2RAB9APAX8
SCHEMBL3458580 0.93 NPC1 (0.50) TDP1NPC1JAK2RAB9APAX8
SCHEMBL7651316 0.93 NPC1 (0.50) TDP1NPC1JAK2RAB9APAX8
SCHEMBL7914609 0.93 NPC1 (0.50) TDP1NPC1JAK2RAB9APAX8
SCHEMBL16415140 0.93 NPC1 (0.50) TDP1NPC1JAK2RAB9APAX8
SCHEMBL709443 0.88 TP53 (0.43) ESR1MEN1KMT2ANPC1JAK2
SCHEMBL13158975 0.82 TDP1 (0.42) TDP1ESR1MEN1KMT2ANPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 161 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 US disclosed
CN-110709774-B Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2023-12-08 CN disclosed
US-20230185195-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2023-06-15 US disclosed
CN-115894536-A Dipyrromethene boron complex compounds, colored compositions and optical filters containing the same 保土谷化学工业株式会社 2023-04-04 CN disclosed
US-11599025-B2 Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed
US-20230013430-A1 SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE TOYO GOSEI CO., LTD. (JP) 2023-01-19 US disclosed
US-20220050379-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2022-02-17 US disclosed
EP-3922456-A1 MATERIAL FOR UNDERLAYER FILM FORMATION USE, RESIST UNDERLAYER FILM, AND LAMINATE Mitsui Chemicals, Inc. (JP) 2021-12-15 EP disclosed
CN-113365820-A Material for forming underlayer film, resist underlayer film, and laminate 三井化学株式会社 2021-09-07 CN disclosed
WO-2021095356-A1 SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE 東洋合成工業株式会社 2021-05-20 WO disclosed
EP-0705834-A1 Quinoxaline-2,3-diones with an azaheterocyclic fused ring CIBA-GEIGY AG (CH) 1996-04-10 EP disclosed
EP-0705835-A1 Quinoxalic-2,3-diones with an oxa or thiaheterocyclic fused ring CIBA-GEIGY AG (CH) 1996-04-10 EP disclosed
EP-0696586-A1 SERINE DERIVATIVE YAMANOUCHI PHARMACEUTICAL CO. LTD. (JP) 1996-02-14 EP disclosed
EP-0678511-A2 Thiazolidine and oxazolidine derivatives, their preparation and their medical use SANKYO COMPANY LIMITED (JP) 1995-10-25 EP disclosed
US-5362617-A Multilayer element of support with color couplers FUJI PHOTO FILM CO., LTD. (JP) 1994-11-08 US disclosed
EP-0570006-A1 A silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1993-11-18 EP disclosed
US-4741980-A Method for increasing color-fastness of organic coloring matter KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1988-05-03 US disclosed
US-4713389-A Fungicidally and bactericidally active acylated saccharin derivatives BAYER AKTIENGESELLSCHAFT (DE) 1987-12-15 US disclosed
EP-0216598-A2 Method for increasing color-fastness of organic coloring matter KONICA CORPORATION (JP) 1987-04-01 EP disclosed
US-4191576-A SULFONYL-SUBSTITUTED PYRROLIDINE, OXAZOLIDINE OR THIAZOLIDINE FUJI PHOTO FILM CO., LTD. (JP) 1980-03-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230013430-A1 SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE ARSA, SULT1A1, RER1 TDP1 3800/4885ESR1 386/4885MEN1 1141/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.