SCHEMBL4903440

SCHEMBL4903440

CCS(=O)(=O)ON=C(c1ccccc1C#N)C(F)(F)S(=O)(=O)C1CCCCC1

nearest known ligand 0.34

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.34
NPSR1 Q6W5P4 2/20 0.32
ALDH1A1 P00352 1/20 0.32
POLB P06746 1/20 0.32
LMNA P02545 1/20 0.32
ATM Q13315 1/20 0.31
HCRTR2 O43614 1/20 0.31
AR P10275 3/20 0.30
TRPM8 Q7Z2W7 1/20 0.30
HSD11B1 P28845 1/20 0.30
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4901474 0.82 QRFPR (0.34) MAPTNPSR1ALDH1A1LMNA
SCHEMBL4903534 0.75 ENPP3 (0.34) ALDH1A1LMNA
SCHEMBL4903505 0.71 MEN1 (0.33) NPSR1ALDH1A1POLBLMNA
SCHEMBL4897575 0.69 MEN1 (0.33) NPSR1ALDH1A1POLB
SCHEMBL10150705 0.66 ALOX15 (0.36) NPSR1ALDH1A1
SCHEMBL4903541 0.65 NPSR1 (0.34) MAPTNPSR1ALDH1A1POLBLMNA
SCHEMBL4900868 0.65 KMT2A (0.34) MAPTALDH1A1POLBLMNAHTT
SCHEMBL6881581 0.65 ALOX15 (0.36) NPSR1ALDH1A1HTT
SCHEMBL18090887 0.64 ALDH1A1 (0.33) MAPTALDH1A1POLBLMNA
SCHEMBL4901366 0.62 QRFPR (0.35) ALDH1A1POLBLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US claimed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US claimed
US-20080187859-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2008-08-07 US disclosed
US-20070269735-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2007-11-22 US disclosed
US-7297461-B2 Radiation sensitive resin composition JSR CORPORATION (JP) 2007-11-20 US disclosed
EP-1736829-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-12-27 EP disclosed
EP-1726608-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-11-29 EP disclosed
US-20050171226-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2005-08-04 US disclosed
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US disclosed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US disclosed