Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 4/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.38 |
| ▸ | S1PR4 | O95977 | 1/20 | 0.38 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | SNCA | P37840 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | NEK2 | P51955 | 2/20 | 0.34 |
| ▸ | ACLY | P53396 | 1/20 | 0.33 |
| ▸ | PHGDH | O43175 | 1/20 | 0.33 |
| ▸ | FLT1 | P17948 | 1/20 | 0.33 |
| ▸ | FLT4 | P35916 | 1/20 | 0.33 |
| ▸ | KDR | P35968 | 1/20 | 0.33 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27680510 | 0.69 | TSHR (0.47) | HDAC6TSHRSMN1; SMN2SNCAPOLB | |
| SCHEMBL8665295 | 0.68 | CYP2A6 (0.45) | MAPTLMNAHTTKMT2ACYP2D6 | |
| SCHEMBL10643820 | 0.67 | HSD17B10 (0.46) | MAPTLMNATSHRSMN1; SMN2KMT2A | |
| SCHEMBL356036 | 0.66 | CYP2A6 (0.36) | MAPTLMNATSHRSMN1; SMN2KMT2A | |
| SCHEMBL491028 | 0.66 | HTR6 (0.50) | MAPTTSHRSMN1; SMN2KMT2APOLB | |
| SCHEMBL1878944 | 0.66 | KDM4E (0.50) | MAPTLMNATSHRSMN1; SMN2KMT2A | |
| SCHEMBL29389290 | 0.66 | APEX1 (0.48) | MAPTLMNATSHRSMN1; SMN2KMT2A | |
| SCHEMBL474108 | 0.66 | APEX1 (0.48) | MAPTLMNATSHRSMN1; SMN2KMT2A | |
| SCHEMBL14151484 | 0.65 | KDM4E (0.49) | MAPTLMNATSHRSMN1; SMN2KMT2A | |
| SCHEMBL341942 | 0.65 | ALDH1A1 (0.42) | MAPTLMNATSHRSMN1; SMN2SNCA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8652759-B2 | Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer | EASTMAN KODAK COMPANY (US) | 2014-02-18 | — | — | US | disclosed |
| US-8632937-B2 | UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer | EASTMAN KODAK COMPANY (US) | 2014-01-21 | — | — | US | disclosed |
| EP-1849600-B1 | Bakeable radiation-sensitive elements with a high resistance to chemicals | EASTMAN KODAK CO (US) | 2013-12-11 | — | — | EP | disclosed |
| US-8507181-B2 | Method for developing and sealing of lithographic printing plates | KODAK (NEAR EAST) INC. | 2013-08-13 | — | — | US | disclosed |
| US-8361701-B2 | Method for making lithographic plates | EASTMAN KODAK COMPANY (US) | 2013-01-29 | — | — | US | disclosed |
| EP-2293144-B1 | Method of drying lithographic printing plates after single-step-processing | EASTMAN KODAK CO (US) | 2012-11-07 | — | — | EP | disclosed |
| US-20120152139-A1 | METHOD AND APPARATUS FOR DRYING AFTER SINGLE-STEP-PROCESSING OF LITHOGRAPHIC PRINTING PLATES | QUALEX INC. | 2012-06-21 | — | — | US | disclosed |
| US-8137891-B2 | Bakeable lithographic printing plates with a high resistance to chemicals | EASTMAN KODAK COMPANY (US) | 2012-03-20 | — | — | US | disclosed |
| US-8119331-B2 | Photopolymer composition usable for lithographic plates | KODAK GRAPHIC COMMUNICATIONS GMBH (DE) | 2012-02-21 | — | — | US | disclosed |
| US-8105755-B2 | Method for processing of photopolymer printing plates with overcoat | EASTMAN KODAK COMPANY (US) | 2012-01-31 | — | — | US | disclosed |
| WO-2007009580-A2 | PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES | EASTMAN KODAK COMPANY (US) | 2007-01-25 | — | — | WO | disclosed |
| EP-1690138-A1 | RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON | Kodak Polychrome Graphics GmbH (DE) | 2006-08-16 | — | — | EP | disclosed |
| US-20060154169-A1 | Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2006-07-13 | — | — | US | disclosed |
| WO-2006044243-A2 | HOLOGRAPHIC STORAGE MEDIUM | GENERAL ELECTRIC COMPANY A CORPORATION OF THE STATE OF NEW YORK (US) | 2006-04-27 | — | — | WO | disclosed |
| US-20060078802-A1 | Holographic storage medium | SABIC INNOVATIVE PLASTICS IP B.V. | 2006-04-13 | — | — | US | disclosed |
| US-20060063101-A1 | Radiation-sensitive elements | KODAK POLYCHROME GRAPHICS LLC (US) | 2006-03-23 | — | — | US | disclosed |
| EP-1586006-A1 | RADIATION-SENSITIVE ELEMENTS | Kodak Polychrome Graphics GmbH (DE) | 2005-10-19 | — | — | EP | disclosed |
| WO-2005054952-A1 | RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2005-06-16 | — | — | WO | disclosed |
| WO-2004049068-A1 | RADIATION-SENSITIVE ELEMENTS | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2004-06-10 | — | — | WO | disclosed |
| US-4017313-A | Photosensitive composition containing a leuco dye, a photosensitizer, an aromatic aldehyde and a secondary or tertiary amine and the use thereof in a direct-print process | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-04-12 | — | — | US | disclosed |