Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.39 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.38 |
| ▸ | RAB9A | P51151 | 5/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.38 |
| ▸ | NPC1 | O15118 | 4/20 | 0.38 |
| ▸ | MAPT | P10636 | 5/20 | 0.36 |
| ▸ | HPGD | P15428 | 4/20 | 0.36 |
| ▸ | LMNA | P02545 | 4/20 | 0.36 |
| ▸ | CASP3 | P42574 | 2/20 | 0.36 |
| ▸ | SENP8 | Q96LD8 | 2/20 | 0.36 |
| ▸ | SENP7 | Q9BQF6 | 2/20 | 0.36 |
| ▸ | SENP6 | Q9GZR1 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | PSMB5 | P28074 | 3/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL81799 | 0.82 | ALDH1A1 (0.38) | KDM4EALDH1A1L3MBTL1RAB9ASMN1; SMN2 | |
| SCHEMBL2494354 | 0.79 | PSMB5 (0.40) | KDM4EALDH1A1L3MBTL1CHRM1RAB9A | |
| SCHEMBL8665808 | 0.76 | CYP1A2 (0.45) | KDM4EALDH1A1L3MBTL1HPGDTSHR | |
| SCHEMBL11594968 | 0.76 | ALDH1A1 (0.34) | ALDH1A1L3MBTL1RAB9ASMN1; SMN2NPC1 | |
| SCHEMBL14973574 | 0.74 | NPC1 (0.41) | KDM4EALDH1A1L3MBTL1CHRM1RAB9A | |
| SCHEMBL5841127 | 0.71 | ALDH1A1 (0.40) | KDM4EALDH1A1L3MBTL1RAB9ASMN1; SMN2 | |
| SCHEMBL2496323 | 0.70 | MEN1 (0.38) | ALDH1A1L3MBTL1CHRM1RAB9ASMN1; SMN2 | |
| SCHEMBL80380 | 0.69 | CHRM1 (0.41) | ALDH1A1CHRM1RAB9ASMN1; SMN2NPC1 | |
| SCHEMBL1877506 | 0.69 | TAAR1 (0.40) | KDM4EALDH1A1L3MBTL1RAB9ASMN1; SMN2 | |
| SCHEMBL491327 | 0.69 | LMNA (0.39) | KDM4ECHRM1RAB9ASMN1; SMN2NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10113907-B2 | Ultraviolet-sensing sheet, ultraviolet-sensing set, and ultraviolet-sensing method | FUJIFILM CORPORATION (JP) | 2018-10-30 | — | — | US | disclosed |
| US-20170131144-A1 | ULTRAVIOLET-SENSING SHEET, ULTRAVIOLET-SENSING SET, AND ULTRAVIOLET-SENSING METHOD | FUJIFILM CORPORATION (JP) | 2017-05-11 | — | — | US | disclosed |
| US-9068082-B2 | Colored curable composition and color filter | FUJIFILM CORPORATION (JP) | 2015-06-30 | — | — | US | disclosed |
| US-20150108086-A1 | COLORED CURABLE COMPOSITION AND COLOR FILTER | FUJIFILM CORPORATION (JP) | 2015-04-23 | — | — | US | disclosed |
| US-8652759-B2 | Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer | EASTMAN KODAK COMPANY (US) | 2014-02-18 | — | — | US | disclosed |
| US-8632937-B2 | UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer | EASTMAN KODAK COMPANY (US) | 2014-01-21 | — | — | US | disclosed |
| EP-1849600-B1 | Bakeable radiation-sensitive elements with a high resistance to chemicals | EASTMAN KODAK CO (US) | 2013-12-11 | — | — | EP | disclosed |
| US-8507181-B2 | Method for developing and sealing of lithographic printing plates | KODAK (NEAR EAST) INC. | 2013-08-13 | — | — | US | disclosed |
| US-8361701-B2 | Method for making lithographic plates | EASTMAN KODAK COMPANY (US) | 2013-01-29 | — | — | US | disclosed |
| EP-2293144-B1 | Method of drying lithographic printing plates after single-step-processing | EASTMAN KODAK CO (US) | 2012-11-07 | — | — | EP | disclosed |
| WO-2007009580-A2 | PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES | EASTMAN KODAK COMPANY (US) | 2007-01-25 | — | — | WO | disclosed |
| US-20060154169-A1 | Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2006-07-13 | — | — | US | disclosed |
| US-20060063101-A1 | Radiation-sensitive elements | KODAK POLYCHROME GRAPHICS LLC (US) | 2006-03-23 | — | — | US | disclosed |
| EP-1586006-A1 | RADIATION-SENSITIVE ELEMENTS | Kodak Polychrome Graphics GmbH (DE) | 2005-10-19 | — | — | EP | disclosed |
| WO-2004111731-A1 | RADIATION-SENSITIVE COMPOSITIONS COMPRISING A 1,4-DIHYDROPYRIDINE SENSITIZER AND IMAGEABLE ELEMENTS BASED THEREON | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2004-12-23 | — | — | WO | disclosed |
| WO-2004049068-A1 | RADIATION-SENSITIVE ELEMENTS | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2004-06-10 | — | — | WO | disclosed |
| US-5866298-A | Radiation sensitive composition for color filters | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1999-02-02 | — | — | US | disclosed |
| US-5792589-A | ORGANIC BINDER; OPTICALLY CROSSLINKABLE COMPOUND; RADICAL-GENERATING AGENT: 2,4,5-TRIARYL IMIDAZOLE DIMER, AMINO-GROUP CONTAINING BENZOPHENONE PHOTOSENSITIZER, A THIOL COMPOUND | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-08-11 | — | — | US | disclosed |
| EP-0775941-A1 | Radiation sensitive composition for color filters | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-28 | — | — | EP | disclosed |
| US-4017313-A | Photosensitive composition containing a leuco dye, a photosensitizer, an aromatic aldehyde and a secondary or tertiary amine and the use thereof in a direct-print process | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-04-12 | — | — | US | disclosed |