SCHEMBL4915958

SCHEMBL4915958

C=CC(=O)OC(O)COC(=O)c1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.58
PRKCA P17252 1/20 0.48
ADRB2 P07550 3/20 0.48
ADRB1 P08588 3/20 0.48
ADRB3 P13945 3/20 0.48
TDP1 Q9NUW8 2/20 0.45
KMT2A Q03164 2/20 0.44
MAPK1 P28482 1/20 0.44
HIF1A Q16665 1/20 0.44
SLC6A2 P23975 1/20 0.44
SLC6A3 Q01959 1/20 0.44
LMNA P02545 2/20 0.42
SLC1A5 Q15758 1/20 0.42
THRB P10828 1/20 0.42
TSHR P16473 2/20 0.41
TP53 P04637 1/20 0.41
AKT1 P31749 1/20 0.41
CYP1A2 P05177 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL223415 0.86 ALDH1A1 (0.51) ALDH1A1ADRB2ADRB1ADRB3TDP1
SCHEMBL223416 0.84 ALDH1A1 (0.48) ALDH1A1ADRB2ADRB1ADRB3TDP1
SCHEMBL30489936 0.84 ALDH1A1 (0.48) ALDH1A1ADRB2ADRB1ADRB3TDP1
SCHEMBL27845251 0.84 ALDH1A1 (0.53) ALDH1A1PRKCAADRB2ADRB1ADRB3
SCHEMBL13135913 0.83 ALDH1A1 (0.60) ALDH1A1PRKCAADRB2ADRB1ADRB3
Ethane SCHEMBL27655301 0.82 ALDH1A1 (0.48) ALDH1A1ADRB2ADRB1ADRB3TDP1
SCHEMBL8463735 0.80 ALDH1A1 (0.64) ALDH1A1PRKCAADRB2ADRB1ADRB3
SCHEMBL28326459 0.80 ALDH1A1 (0.64) ALDH1A1PRKCAADRB2ADRB1ADRB3
SCHEMBL181502 0.78 THRB (0.55) ADRB2ADRB1ADRB3KMT2ALMNA
SCHEMBL3720236 0.78 ALDH1A1 (0.43) ALDH1A1ADRB2ADRB1ADRB3KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080318087-A1 MAGNETIC RECORDING MEDIUM, AND METHOD OF MANUFACTURE THEREOF FUJIFILM CORPORATION (JP) 2008-12-25 US disclosed
EP-1226976-B1 Hydrophilic polymer having silane coupling group terminal and lithographic printing plate base FUJI PHOTO FILM CO LTD (JP) 2006-11-02 EP disclosed
US-7060409-B2 Imageable elements with improved dot stability EASTMAN KODAK COMPANY (US) 2006-06-13 US disclosed
EP-1088679-B1 Lithographic printing plate support and lithographic printing plate precursor using the same FUJI PHOTO FILM CO LTD (JP) 2006-05-24 EP disclosed
US-20060073414-A1 Hydrophilic polymer having silane coupling group terminal and lithographic printing plate base FUJI PHOTO FILM CO., LTD. (JP) 2006-04-06 US disclosed
US-7001673-B2 an acrylic or vinyl homo or copolymer containing mercaptoalkylsilane or mercaptoalkylsilaneoxy termianl group FUJI PHOTO FILM CO., LTD. (JP) 2006-02-21 US disclosed
US-6977131-B2 Selected polymeric sulfonate acid generators and their use in processes for imaging radiation-sensitive elements KODAK POLYCHROME GRAPHICS LLC (US) 2005-12-20 US disclosed
EP-1601724-A2 INFRA RED ABSORBING COMPOUNDS AND THEIR USE IN PHOTOIMAGEABLE ELEMENTS Kodak Polychrome Graphics (US) 2005-12-07 EP disclosed
US-6902861-B2 Infrared absorbing compounds and their use in photoimageable elements KODAK POLYCHROME GRAPHICS, LLC (US) 2005-06-07 US disclosed
EP-1508072-A2 ACID GENERATING AGENTS AND THEIR USE IN PROCESSES FOR IMAGING RADIATION-SENSITIVE ELEMENTS Kodak Polychrome Graphics LLC (US) 2005-02-23 EP disclosed
US-6787281-B2 SUCH AS 2-METHOXY-4-(PHENYLAMINO)-BENZENEDIAZONIUM DODECYL SULFATE (MSDS), WHICH DOES NOT CONTAIN OZONE DEPLETION ELEMENTS (FLUORINE, HEAVY METALS); POLLUTION CONTROL; LITHOGRAPHY KODAK POLYCHROME GRAPHICS LLC 2004-09-07 US disclosed
WO-2004036314-A2 ACID GENERATING AGENTS AND THEIR USE IN PROCESSES FOR IMAGING RADIATION-SENSITIVE ELEMENTS KODAK POLYCHROME GRAPHICS LLC (US) 2004-04-29 WO disclosed
WO-2003102692-A1 RADIATION-SENSITIVE COMPOSITIONS CONTAINING POLYMERIC SULFONATE ACID GENERATORS AND THEIR USE IN IMAGING KODAK POLYCHROME GRAPHICS LLC (US) 2003-12-11 WO disclosed
US-20030224284-A1 Selected polymeric sulfonate acid generators and their use in processes for imaging radiation-sensitive elements CITICORP NORTH AMERICA, INC., AS AGENT 2003-12-04 US disclosed
US-20030219673-A1 Selected acid generating agents and their use in processes for imaging radiation-sensitive elements FPC INC. 2003-11-27 US disclosed
US-6607866-B1 Polyethylene terephthalate films having hydrophilic graft polymers bonded to the surfaces to form photosensitive, antisoilant ink receiver layers FUJI PHOTO FILM CO., LTD. (JP) 2003-08-19 US disclosed
US-20020134266-A1 Hydrophilic polymer having silane coupling group terminal and lithographic printing plate base FUJIFILM CORPORATION (JP) 2002-09-26 US disclosed
EP-1226976-A1 Hydrophilic polymer having silane coupling group terminal and lithographic printing plate base FUJI PHOTO FILM CO., LTD. (JP) 2002-07-31 EP disclosed
EP-1088679-A2 Lithographic printing plate support and lithographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2001-04-04 EP disclosed
US-5965319-A COMPRISES A AN ONIUM SALT COMPOUND E.G. DIAZONIUM SULFONATE, A CROSSLINKING AGENT CROSSLINKABLE BY AN ACID, A POLYMER COMPOUND HAVING AN ALKALINE-SOLUBLE GROUP, AND AN INFRARED RAY ABSORBING AGENT; LITHOGRAPHY; FORM PLATES; STORAGE STABILITY; FUJI PHOTO FILM CO., LTD. (JP) 1999-10-12 US disclosed