SCHEMBL223415

SCHEMBL223415

C=CC(=O)OC(O)COC(=O)c1ccccc1C(=O)OCC(O)OC(=O)C=C

nearest known ligand 0.51

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.51
TSHR P16473 6/20 0.51
CYP3A4 P08684 3/20 0.51
ADRB2 P07550 4/20 0.43
ADRB1 P08588 4/20 0.43
ADRB3 P13945 4/20 0.43
CA2 P00918 1/20 0.42
HSD17B10 Q99714 1/20 0.42
PRSS1 P07477 1/20 0.40
PRSS2 P07478 1/20 0.40
PRSS3 P35030 1/20 0.40
NPC1 O15118 1/20 0.40
THRB P10828 1/20 0.40
TDP1 Q9NUW8 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
TP53 P04637 1/20 0.38
MAPK1 P28482 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30489936 0.94 ALDH1A1 (0.48) ALDH1A1TSHRCYP3A4ADRB2ADRB1
SCHEMBL223416 0.94 ALDH1A1 (0.48) ALDH1A1TSHRCYP3A4ADRB2ADRB1
Ethane SCHEMBL27655301 0.92 ALDH1A1 (0.48) ALDH1A1TSHRCYP3A4ADRB2ADRB1
SCHEMBL4915958 0.86 ALDH1A1 (0.58) ALDH1A1TSHRADRB2ADRB1ADRB3
SCHEMBL181429 0.83 TSHR (0.63) ALDH1A1TSHRCYP3A4ADRB2ADRB1
SCHEMBL5035248 0.83 TSHR (0.53) ALDH1A1TSHRCYP3A4ADRB2ADRB1
SCHEMBL7550987 0.82 TSHR (0.58) ALDH1A1TSHRCYP3A4ADRB2ADRB1
SCHEMBL35051 0.82 TSHR (0.54) ALDH1A1TSHRCYP3A4ADRB2ADRB1
SCHEMBL8610885 0.82 TSHR (0.54) ALDH1A1TSHRCYP3A4ADRB2ADRB1
SCHEMBL28071258 0.81 TSHR (0.53) ALDH1A1TSHRCYP3A4ADRB2ADRB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116931370-A Photosensitive resin composition and cured product 新应材股份有限公司 2023-10-24 CN disclosed
CN-116931371-A Photosensitive resin composition and cured product 新应材股份有限公司 2023-10-24 CN disclosed
US-20230324793-A1 PHOTOSENSITIVE RESIN COMPOSITION AND CURED PRODUCT ECHEM SOLUTIONS CORP. (TW) 2023-10-12 US disclosed
US-20230323134-A1 PHOTOSENSITIVE RESIN COMPOSITION AND CURED PRODUCT ECHEM SOLUTIONS CORP. (TW) 2023-10-12 US disclosed
CN-113736316-A UV curable inkjet inks 爱克发有限公司 2021-12-03 CN disclosed
US-11029597-B2 Method for producing pattern laminate, method for producing reversal pattern, and pattern laminate FUJIFILM CORPORATION (JP) 2021-06-08 US disclosed
US-10373863-B2 Method of manufacturing porous body, porous body, method of manufacturing device, device, method of manufacturing wiring structure, and wiring structure FUJIFILM CORPORATION (JP) 2019-08-06 US disclosed
US-10288976-B2 Light control film HITACHI CHEMICAL COMPANY, LTD. (JP) 2019-05-14 US disclosed
US-20180364566-A1 METHOD FOR PRODUCING PATTERN LAMINATE, METHOD FOR PRODUCING REVERSAL PATTERN, AND PATTERN LAMINATE FUJIFILM CORPORATION (JP) 2018-12-20 US disclosed
EP-2434342-B1 Method for producing curable composition for imprints FUJIFILM CORP (JP) 2018-06-20 EP disclosed
US-20100133728-A1 CURABLE COMPOSITION FOR PHOTOIMPRINT, AND METHOD FOR PRODUCING CURED PRODUCT USING SAME FUJIFILM CORPORATION (JP) 2010-06-03 US disclosed
US-20100121013-A1 CURABLE COMPOSITION FOR PHOTOIMPRINT, ITS CURED PRODUCT AND PRODUCTION METHOD FOR IT, AND COMPONENT OF LIQUID-CRYSTAL DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2010-05-13 US disclosed
WO-2010050614-A1 COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD FUJIFILM CORPORATION (JP) 2010-05-06 WO disclosed
US-20100009138-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2010-01-14 US disclosed
US-20100009287-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2010-01-14 US disclosed
US-20100009137-A1 COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD FUJIFILM CORPORATION (JP) 2010-01-14 US disclosed
US-20090283937-A1 CURABLE COMPOSITION FOR NANOIMPRINT, AND PATTERNING METHOD FUJIFILM CORPORATION (JP) 2009-11-19 US disclosed
US-20090011367-A1 INTERFACE BINDER, RESIST COMPOSITION CONTAINING THE SAME, LAMINATE FOR FORMING MAGNETIC RECORDING MEDIUM HAVING LAYER CONTAINING THE SAME, MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM USING THE SAME, AND MAGNETIC RECORDING MEDIUM PRODUCED BY THE MANUFACTURING METHOD FUJIFILM CORPORATION (JP) 2009-01-08 US disclosed
CN-1749856-A Curable jettable liquid for flexography AGFA GEVAERT (BE) 2006-03-22 CN disclosed
CN-1749858-A Method for manufacturing a flexographic printing master AGFA GEVAERT (BE) 2006-03-22 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100121013-A1 CURABLE COMPOSITION FOR PHOTOIMPRINT, ITS CURED PRODUCT AND PRODUCTION METHOD FOR IT, AND COMPONENT OF LIQUID-CRYSTAL DISPLAY DEVICE MBTD1, CRY1, CCNT1 ALDH1A1 647/4885TSHR 4253/4885CYP3A4 3326/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.