Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 2/20 | 0.39 |
| ▸ | GLA | P06280 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
| ▸ | NPC1 | O15118 | 2/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | SLC6A2 | P23975 | 5/20 | 0.35 |
| ▸ | SLC6A4 | P31645 | 5/20 | 0.35 |
| ▸ | SLC6A3 | Q01959 | 5/20 | 0.35 |
| ▸ | EGFR | P00533 | 1/20 | 0.35 |
| ▸ | TOP2A | P11388 | 1/20 | 0.35 |
| ▸ | TOP2B | Q02880 | 1/20 | 0.35 |
| ▸ | CTSK | P43235 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9435754 | 0.95 | HTT (0.35) | HTTGLATSHRL3MBTL1KMT2A | |
| SCHEMBL9435763 | 0.89 | KMT2A (0.37) | HTTKMT2ANPC1RAB9ASLC6A2 | |
| SCHEMBL20213737 | 0.82 | KMT2A (0.38) | HTTTSHRKMT2ANPC1RAB9A | |
| SCHEMBL6642483 | 0.81 | SLC7A5 (0.43) | KMT2ANPC1RAB9ASLC6A2SLC6A4 | |
| SCHEMBL6129396 | 0.80 | — | — | |
| SCHEMBL175346 | 0.79 | GLA (0.40) | HTTGLATSHRL3MBTL1KMT2A | |
| SCHEMBL7269210 | 0.79 | NPC1 (0.50) | HTTGLATSHRL3MBTL1KMT2A | |
| SCHEMBL7284168 | 0.79 | NPC1 (0.50) | HTTGLATSHRL3MBTL1KMT2A | |
| SCHEMBL7276887 | 0.79 | NPC1 (0.50) | HTTGLATSHRL3MBTL1KMT2A | |
| SCHEMBL7153932 | 0.79 | GLA (0.38) | HTTGLATSHRL3MBTL1SLC6A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1372561-A | Synthesis of Substituted Pyrazolopyrimidines | NEUROCRINE BIOSCIENCES INC (US) | 2002-10-02 | — | — | CN | claimed |
| CN-116946989-A | Preparation method of phosphane/deuterated phosphane and derivatives thereof | 北京大学 | 2023-10-27 | — | — | CN | disclosed |
| CN-110117290-A | A kind of synthetic method of five-ring heterocycles and two pyridine compounds and its derivative | 哈尔滨工业大学（威海） | 2019-08-13 | — | — | CN | disclosed |
| CN-106008491-B | A kind of preparation method of razaxaban | 苏州汇和药业有限公司 | 2019-04-05 | — | — | CN | disclosed |
| CN-108164519-A | The synthetic method of razaxaban process contaminants | 江苏悦兴医药技术有限公司 | 2018-06-15 | — | — | CN | disclosed |
| US-8541541-B2 | Polythiophene, polyaniline, polypyrrol, a methacrylic polymer, copolymer or terpolymer, polyamides, and ethylenically unsaturated copolymerizable monomers other than methylmethacrylate; using a controlled radical polymerization initiator of an alkoxyamine | ARKEMA INC. (US) | 2013-09-24 | — | — | US | disclosed |
| EP-1882001-B1 | CONDUCTIVE BLOCK COPOLYMERS, METHODS AND ARTICLES | ARKEMA INC (US) | 2013-01-02 | — | — | EP | disclosed |
| US-20080169451-A1 | Conductive Block Copolymers | ARKEMA INC. (US) | 2008-07-17 | — | — | US | disclosed |
| EP-1882001-A2 | CONDUCTIVE BLOCK COPOLYMERS | Arkema Inc. (US) | 2008-01-30 | — | — | EP | disclosed |
| WO-2006096550-A2 | CONDUCTIVE BLOCK COPOLYMERS | ARKEMA INC. (US) | 2006-09-14 | — | — | WO | disclosed |
| CN-1152033-C | Synthese of substitutd pyrazolopyrimidines | Ŧ����������ѧ��˾ | 2004-06-02 | — | — | CN | disclosed |
| CN-1372561-A | Synthesis of Substituted Pyrazolopyrimidines | NEUROCRINE BIOSCIENCES INC (US) | 2002-10-02 | — | — | CN | disclosed |
| US-5306601-A | Laminating a semiconductor a polythiophenes layer, inorganic layer and photoresists layer, heating and hardening each layer | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1994-04-26 | — | — | US | disclosed |
| EP-0348961-B1 | Fine pattern forming material and pattern forming method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 1994-01-26 | — | — | EP | disclosed |
| EP-0530849-A2 | Fine pattern forming material and pattern forming method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1993-03-10 | — | — | EP | disclosed |
| EP-0348961-A2 | Fine pattern forming material and pattern forming method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1990-01-03 | — | — | EP | disclosed |