SCHEMBL4933674

SCHEMBL4933674

C=CC(=O)C(C(=O)O)C(C)(C)C

nearest known ligand 0.35

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.35
ALDH1A1 P00352 2/20 0.33
MAPT P10636 1/20 0.30
PTGS1 P23219 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28243171 0.82 LMNA (0.32) LMNAALDH1A1TSHR
SCHEMBL897666 0.76 ALDH1A1 (0.39) LMNAALDH1A1MAPTPTGS1TSHR
SCHEMBL28001468 0.76 ALDH1A1 (0.31) ALDH1A1TSHR
SCHEMBL21269846 0.73 ALDH1A1 (0.38) LMNAALDH1A1MAPTPTGS1TSHR
SCHEMBL21269999 0.73 ALDH1A1 (0.38) LMNAALDH1A1MAPTPTGS1TSHR
Methyl Alcohol SCHEMBL28215181 0.73 ALDH1A1 (0.38) LMNAALDH1A1MAPTPTGS1TSHR
Magnesium SCHEMBL29455973 0.73 ALDH1A1 (0.38) LMNAALDH1A1MAPTPTGS1TSHR
SCHEMBL21268936 0.73 ALDH1A1 (0.38) LMNAALDH1A1MAPTPTGS1TSHR
SCHEMBL28314602 0.73 ALDH1A1 (0.38) LMNAALDH1A1MAPTPTGS1TSHR
SCHEMBL28315607 0.73 ALDH1A1 (0.38) LMNAALDH1A1MAPTPTGS1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4088499-A METHYLENE GROUP CONTAINING POLYMERS EASTMAN KODAK COMPANY (US) 1978-05-09 US claimed
US-20080070998-A1 Foam Production Method OJI PAPER CO., LTD. (JP) 2008-03-20 US disclosed
EP-1795553-A1 PROCESS FOR PRODUCING FOAM Oji Paper Co., Ltd. (JP) 2007-06-13 EP disclosed
US-6828083-B2 Comprising photoactive component and polymer that comprises groups reactive to crosslinking and photoacid-labile groups SHIPLEY COMPANY, L.L.C. 2004-12-07 US disclosed
US-20020012869-A1 Positive photoresists containing crosslinked polymers SHIPLEY COMPANY, L.L.C. 2002-01-31 US disclosed
US-20010053496-A1 Photoresist compositions and use of same SHIPLEY COMPANY, L.L.C. 2001-12-20 US disclosed
EP-1143300-A1 Photoresist compositions and use of same Shipley Company LLC (US) 2001-10-10 EP disclosed
EP-1126321-A1 Positive photoresists containing crosslinked polymers Shipley Company LLC (US) 2001-08-22 EP disclosed