SCHEMBL4936719

SCHEMBL4936719

Cc1ccccc1C(=O)N=C=O

nearest known ligand 0.52

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ERCC5 P28715 1/20 0.46
FEN1 P39748 1/20 0.46
HPGD P15428 2/20 0.43
KMT2A Q03164 1/20 0.42
HTT P42858 1/20 0.41
TSHR P16473 1/20 0.40
MAPK1 P28482 1/20 0.40
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
MYC P01106 1/20 0.39
POLB P06746 1/20 0.39
ELANE P08246 1/20 0.39
TYK2 P29597 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1548146 0.86 HPGD (0.44) ERCC5FEN1HPGDKMT2AHTT
SCHEMBL3395153 0.85 ALDH1A1 (0.42) HPGDTSHRNPC1SMN1; SMN2POLB
SCHEMBL4743346 0.85 ESR1 (0.42) ERCC5FEN1HPGDKMT2AHTT
SCHEMBL1557846 0.82 HPGD (0.42) ERCC5FEN1HPGDKMT2AHTT
SCHEMBL1135687 0.82 HPGD (0.42) ERCC5FEN1HPGDKMT2AHTT
SCHEMBL6424083 0.82 KAT6A (0.41) ERCC5FEN1HPGDKMT2AHTT
SCHEMBL6279965 0.79 HPGD (0.40) ERCC5FEN1HPGDHTTNPC1
SCHEMBL5680618 0.79 HPGD (0.48) ERCC5FEN1HPGDKMT2AHTT
SCHEMBL9687945 0.78 ERCC5 (0.41) ERCC5FEN1HPGDKMT2AHTT
SCHEMBL21440264 0.78 ERCC5 (0.41) ERCC5FEN1HPGDKMT2AHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-54115380-A None JP disclosed
CN-101052918-B Photosensitive composition, pattern forming material, photosensitive laminate, pattern forming apparatus, and pattern forming method ASAHI KASEI E MATERIALS CORP 2012-09-26 CN disclosed
CN-101103310-B Material for pattern formation, apparatus for pattern formation, and method for pattern formation FUJI FILM CORP 2012-03-14 CN disclosed
CN-101410421-B Photopolymerization initiator, photosensitive composition, photosensitive film, photosensitive laminate, method of forming permanent pattern and printed board FUJI PHOTO FILM CO LTD 2011-07-27 CN disclosed
CN-101410421-A Photopolymerization initiator, photosensitive composition, photosensitive film, photosensitive laminate, method of forming permanent pattern and printed board FUJIFILM CORP (JP) 2009-04-15 CN disclosed
US-20080118867-A1 Pattern Forming Material, Pattern Forming Apparatus, And Pattern Forming Process ASAHI KASEI E-MATERIALS CORPORATION (JP) 2008-05-22 US disclosed
US-20080113302-A1 Pattern Forming Process FUJIFILM CORPORATION (JP) 2008-05-15 US disclosed
CN-101103310-A Material for pattern formation, apparatus for pattern formation, and method for pattern formation FUJI FILM CORP (JP) 2008-01-09 CN disclosed
CN-101085759-A Amino-phthalazinone derivatives active as kinase inhibitors, process for their preparation and pharmaceutical compositions containing them PHARMACIA ITALIA SPA (IT) 2007-12-12 CN disclosed
CN-101052918-A Photosensitive composition, pattern forming material, photosensitive laminate, pattern forming apparatus, and pattern forming method FUJIFILM CORP (JP) 2007-10-10 CN disclosed
EP-0047496-A1 Sulfonyl ureas, processes for their production, pharmaceutical compositions based on these compounds and their use HOECHST AKTIENGESELLSCHAFT (DE) 1982-03-17 EP disclosed
EP-0045423-A1 Process for the alpha-halogenation of possibly substituted methyl aromatics BAYER AG (DE) 1982-02-10 EP disclosed
US-4293552-A Novel 1-(mono-o-substituted benzoyl)-3-(substituted pyrazinyl) ureas ELI LILLY AND COMPANY (US) 1981-10-06 US disclosed
US-4173637-A N-Benzoyl-N'-pyridyloxy phenyl urea and insecticidal compositions thereof ISHIHARA SANGYO KAISHA LTD. (JP) 1979-11-06 US disclosed
JP-S54115380-A N-BENZOYL-N'-PYRIDYLOXY-PHENYLUREA, ITS PREPARATION, AND INSECTICIDES CONTAINING IT ISHIHARA SANGYO KAISHA LTD 1979-09-07 JP disclosed
US-4150158-A Oxadiazindione derivatives useful as insecticides IMPERIAL CHEMICAL INDUSTRIES LIMITED (GB) 1979-04-17 US disclosed
US-4072712-A FROM ISOCYANATES, CATALYSIS BAYER AKTIENGESELLSCHAFT (DT) 1978-02-07 US disclosed
US-4068002-A INSECTICIDES BAYER AKTIENGESELLSCHAFT (DT) 1978-01-10 US disclosed
US-4064267-A 2',3,6'-Trichloro-4-cyano-4'-[N-(N'-(o-substituted-benzoyl))-ureido]-diphenyl ether insecticides BAYER AKTIENGESELLSCHAFT (DT) 1977-12-20 US disclosed
US-4005223-A Insecticidal 2-chloro-4'-[N-(N'-benzoyl)-ureido]-diphenyl ethers BAYER AKTIENGESELLSCHAFT (DT) 1977-01-25 US disclosed