Thiobenzoic Acid

Thiobenzoic Acid

SCHEMBL4937636

OC(=S)c1ccccc1.OC(=S)c1ccccc1-c1ccccc1

nearest known ligand 0.48

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BCAT2 O15382 1/20 0.48
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
CHRNB2 P17787 3/20 0.43
CHRNB4 P30926 3/20 0.43
CHRNA3 P32297 3/20 0.43
CHRNA4 P43681 3/20 0.43
ALDH1A1 P00352 4/20 0.41
HPGD P15428 1/20 0.41
BCL2L1 Q07817 1/20 0.41
HSD17B10 Q99714 1/20 0.41
HNF4A P41235 1/20 0.41
TSHR P16473 1/20 0.41
RECQL P46063 1/20 0.41
BACE1 P56817 1/20 0.38
FABP3 P05413 1/20 0.38
FABP4 P15090 1/20 0.38
FABP5 Q01469 1/20 0.38
HTT P42858 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6070294 0.91 BCAT2 (0.56) BCAT2MEN1KMT2ASMN1; SMN2CHRNB2
Thiobenzoic Acid SCHEMBL7573638 0.85 HNF4A (0.44) BCAT2MEN1KMT2ASMN1; SMN2CHRNB2
SCHEMBL1478854 0.85 BCAT2 (0.48) BCAT2MEN1KMT2ASMN1; SMN2CHRNB2
SCHEMBL9055453 0.82 BCAT2 (0.47) BCAT2MEN1KMT2ASMN1; SMN2CHRNB2
SCHEMBL2129015 0.81 BCAT2 (0.50) BCAT2MEN1KMT2ASMN1; SMN2CHRNB2
SCHEMBL27727903 0.79 ALDH1A1 (0.41) BCAT2MEN1KMT2ASMN1; SMN2CHRNB2
SCHEMBL7020490 0.78 BACE1 (0.41) BCAT2MEN1KMT2ASMN1; SMN2ALDH1A1
Thiobenzoic Acid SCHEMBL15282156 0.76 ALDH1A1 (0.50) MEN1KMT2ASMN1; SMN2ALDH1A1HPGD
Thiobenzoic Acid SCHEMBL28199536 0.76 ALDH1A1 (0.50) MEN1KMT2ASMN1; SMN2ALDH1A1HPGD
Thiobenzoic Acid SCHEMBL160729 0.76 ALDH1A1 (0.50) MEN1KMT2ASMN1; SMN2ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed
EP-1975712-A2 Positive resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-10-01 EP disclosed