Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.36 |
| ▸ | LMNA | P02545 | 4/20 | 0.36 |
| ▸ | EHMT2 | Q96KQ7 | 3/20 | 0.34 |
| ▸ | EHMT1 | Q9H9B1 | 3/20 | 0.34 |
| ▸ | ABCB11 | O95342 | 2/20 | 0.34 |
| ▸ | HTT | P42858 | 2/20 | 0.34 |
| ▸ | GSDMD | P57764 | 2/20 | 0.34 |
| ▸ | CA12 | O43570 | 2/20 | 0.34 |
| ▸ | CA1 | P00915 | 2/20 | 0.34 |
| ▸ | CA2 | P00918 | 2/20 | 0.34 |
| ▸ | CA4 | P22748 | 2/20 | 0.34 |
| ▸ | CA9 | Q16790 | 2/20 | 0.34 |
| ▸ | CYP2E1 | P05181 | 1/20 | 0.34 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.33 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11527916 | 0.91 | CYP1A2 (0.47) | CYP1A2ALDH1A1CYP3A4SMN1; SMN2LMNA | |
| SCHEMBL10635366 | 0.83 | CYP1A2 (0.41) | CYP1A2ALDH1A1CYP3A4SMN1; SMN2LMNA | |
| SCHEMBL1334938 | 0.82 | ALDH1A1 (0.48) | CYP1A2ALDH1A1CYP3A4LMNAEHMT2 | |
| SCHEMBL4272718 | 0.74 | ALDH1A1 (0.56) | CYP1A2ALDH1A1CYP3A4SMN1; SMN2LMNA | |
| SCHEMBL28629980 | 0.74 | — | — | |
| SCHEMBL11091749 | 0.72 | MAPT (0.45) | ALDH1A1SMN1; SMN2LMNATDP1HPGD | |
| SCHEMBL11526002 | 0.72 | CYP1A2 (0.42) | CYP1A2ALDH1A1SMN1; SMN2LMNAHTT | |
| SCHEMBL6517665 | 0.71 | CYP1A2 (0.53) | CYP1A2ALDH1A1SMN1; SMN2LMNAHTT | |
| SCHEMBL28491839 | 0.71 | CYP1A2 (0.48) | CYP1A2ALDH1A1CYP3A4SMN1; SMN2LMNA | |
| SCHEMBL11589871 | 0.71 | CYP1A2 (0.48) | CYP1A2ALDH1A1CYP3A4SMN1; SMN2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0114341-B1 | DYE-CONTAINING LAYER IN A PHOTOPOLYMERISABLE COMPOSITION, AND PROCESS FOR OBTAINING RELIEF AND PRINTING FORMES | BASF Aktiengesellschaft (DE) | 1991-07-24 | — | — | EP | claimed |
| US-12210284-B2 | Photosensitive composition | XSYS GERMANY GMBH (DE) | 2025-01-28 | — | — | US | disclosed |
| CN-111512231-B | Relief precursors with low degree of cup-shaped extrusion and grooving | 恩熙思德国有限公司 | 2024-03-15 | — | — | CN | disclosed |
| US-11914293-B2 | Radiatioin-curable mixture containing low-functionalised, partially saponified polyvinyl acetate | FLINT GROUP GERMANY GMBH (DE) | 2024-02-27 | — | — | US | disclosed |
| US-11822246-B2 | Relief precursor having low cupping and fluting | FLINT GROUP GERMANY GMBH (DE) | 2023-11-21 | — | — | US | disclosed |
| EP-4009106-A1 | PHOTOSENSITIVE COMPOSITION | Flint Group Germany GmbH (DE) | 2022-06-08 | — | — | EP | disclosed |
| US-20220171287-A1 | PHOTOSENSITIVE COMPOSITION | FLINT GROUP GERMANY GMBH (DE) | 2022-06-02 | — | — | US | disclosed |
| US-20220171288-A1 | Photosensitive composition | FLINT GROUP GERMANY GMBH (DE) | 2022-06-02 | — | — | US | disclosed |
| EP-4006639-A1 | PHOTOSENSITIVE COMPOSITION | Flint Group Germany GmbH (DE) | 2022-06-01 | — | — | EP | disclosed |
| CN-114563920-A | Photosensitive composition | 富林特集团德国有限公司 | 2022-05-31 | — | — | CN | disclosed |
| US-4946758-A | RELIEF IMAGE FORMING LAYER; HIGH TENSILE STRENGTH POLYMER AND COVERING | BASF AKTIENGESELLSCHAFT (DE) | 1990-08-07 | — | — | US | disclosed |
| US-4925769-A | Light-sensitive photopolymerizable laminate material | BASF AKTIENGESELLSCHAFT (DE) | 1990-05-15 | — | — | US | disclosed |
| US-4900795-A | PHOTOPOLMERIZABLE POLYMER COMPRISING ETHYLENE, (METH)ACRYLIC ACID AND VINYL OR ACRYLATE MONOMER NEUTRALIZED BY A CYCLIC AMINE OR HYDROXY-CONTAINING AMINE; PHOTORESISTS; PRINTING PLATES; OZONE RESISTANCE; ELONGATION; TENSILE STRENGTH | BASF AKTIENGESELLSCHAFT (DE) | 1990-02-13 | — | — | US | disclosed |
| US-4877715-A | STORAGE STABLE, NONTACKY, FLEXIBLE | BASF AKTIENGESELLSCHAFT (DE) | 1989-10-31 | — | — | US | disclosed |
| US-4816379-A | Production of relief plates and printing plates by a positive-working method | BASF AKTIENGESELLSCHAFT (DE) | 1989-03-28 | — | — | US | disclosed |
| US-4777115-A | PHOTOINITIATOR, UNSATURATED MONOMERS; LIGHT SENSITIVE ELEMENTS | BASF AKTIENGESELLSCHAFT (DE) | 1988-10-11 | — | — | US | disclosed |
| US-4762892-A | ETHYLENE-ACRYLIC OR METHACRYLIC ACID-ALKYL ACRYLATE MODIFIED TO CONTAIN UNSATURATED SIDE CHAINS | BASF AKTIENGESELLSCHAFT (DE) | 1988-08-09 | — | — | US | disclosed |
| US-4554240-A | Photosensitive recording material which can be developed with water, for the production of printing plates, relief plates or resist images | BASF AKTIENGESELLSCHAFT (DE) | 1985-11-19 | — | — | US | disclosed |
| US-4420552-A | Method of producing printed images with a color facsimile printing device | Peck, Richard M. (US) | 1983-12-13 | — | — | US | disclosed |
| US-4390614-A | Color facsimile printing device comprising photosensitive ink in pores | Peck, Richard M. (US) | 1983-06-28 | — | — | US | disclosed |