Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR2 | Q92731 | 2/20 | 0.37 |
| ▸ | TRIM24 | O15164 | 2/20 | 0.33 |
| ▸ | TRIM33 | Q9UPN9 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3626745 | 0.81 | ESR2 (0.35) | ESR2TRIM24TRIM33ALDH1A1LMNA | |
| SCHEMBL8486388 | 0.79 | LMNA (0.47) | ESR2TRIM24TRIM33ALDH1A1LMNA | |
| Ethylene SCHEMBL4704387 | 0.77 | LMNA (0.45) | ESR2ALDH1A1LMNATSHRTRPA1 | |
| Ethylene SCHEMBL4702024 | 0.77 | LMNA (0.36) | ESR2LMNATSHRTRPA1 | |
| SCHEMBL1353365 | 0.74 | LMNA (0.37) | LMNA | |
| SCHEMBL28081306 | 0.74 | ESR2 (0.38) | ESR2TRIM24TRIM33ALDH1A1 | |
| SCHEMBL18951906 | 0.74 | ESR2 (0.39) | ESR2TRIM24TRIM33ALDH1A1LMNA | |
| SCHEMBL6126 | 0.72 | GABRP (0.46) | ESR2LMNATSHR | |
| SCHEMBL4857880 | 0.72 | — | — | |
| SCHEMBL13797790 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080220369-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-11 | — | — | US | disclosed |
| US-6835527-B2 | Lithography; forming semiconductors | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-12-28 | — | — | US | disclosed |
| EP-1143299-B1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2003-07-16 | — | — | EP | disclosed |
| US-20030039918-A1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-02-27 | — | — | US | disclosed |
| US-20020155378-A1 | Chemical amplifying type positive resist compositions | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2002-10-24 | — | — | US | disclosed |
| US-6406830-B2 | BIS(SULFONIUM METHYL)KETONE BISPERFLUOROALKANESULFONATE ACID GENERATOR WITH TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALTS, AND A RESIN HAVING A UNIT UNSTABLE TO AN ACID, SUCH AS 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE; RESOLUTION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-06-18 | — | — | US | disclosed |
| US-20020006582-A1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-17 | — | — | US | disclosed |