⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL75661 | 0.82 | ALDH1A1 (0.50) | — | |
| SCHEMBL18827942 | 0.79 | ALDH1A1 (0.32) | — | |
| SCHEMBL19294370 | 0.79 | ALDH1A1 (0.52) | — | |
| SCHEMBL18708100 | 0.77 | MGAM (0.40) | — | |
| SCHEMBL3394389 | 0.76 | TSHR (0.33) | — | |
| SCHEMBL8386034 | 0.76 | ELANE (0.33) | — | |
| SCHEMBL3692054 | 0.74 | — | — | |
| SCHEMBL3838478 | 0.74 | LAP3 (0.32) | — | |
| SCHEMBL825697 | 0.71 | LMNA (0.43) | — | |
| SCHEMBL15467042 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180120706-A1 | PATTERN FORMING METHOD, LAMINATE, AND RESIST COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |
| US-9683150-B2 | Curable composition, adhesive, method of producing fiber-reinforced composite material, and fiber-reinforced composite material | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-20 | — | — | US | disclosed |
| EP-2930200-B1 | Curable composition, adhesive, method of producing fiber-reinforced composite material, and fiber-reinforced composite material | TOKYO OHKA KOGYO CO LTD (JP) | 2016-07-20 | — | — | EP | disclosed |
| EP-2930200-A1 | Curable composition, adhesive, method of producing fiber-reinforced composite material, and fiber-reinforced composite material | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-14 | — | — | EP | disclosed |
| US-20150252229-A1 | CURABLE COMPOSITION, ADHESIVE, METHOD OF PRODUCING FIBER-REINFORCED COMPOSITE MATERIAL, AND FIBER-REINFORCED COMPOSITE MATERIAL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-10 | — | — | US | disclosed |
| US-20110046293-A1 | Light diffusion film, anti-reflection film, polarizing plate and image | FUJIFILM CORPORATION (JP) | 2011-02-24 | — | — | US | disclosed |
| US-20080160449-A1 | Photoresist polymer having nano-smoothness and etching resistance, and resist composition | LION CORPORATION (JP) | 2008-07-03 | — | — | US | disclosed |
| US-7315341-B2 | Liquid crystal display device with retardation layer with different relative humidity | FUJIFILM CORPORATION (JP) | 2008-01-01 | — | — | US | disclosed |
| US-20070148585-A1 | Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer | LION CORPORATION. | 2007-06-28 | — | — | US | disclosed |
| US-20060246233-A1 | Light diffusion film, anti-reflection film, polarizing plate and image display device | FUJI PHOTO FILM CO., LTD. (JP) | 2006-11-02 | — | — | US | disclosed |
| EP-1698645-A1 | HYPERBRANCHED POLYMER, PROCESS FOR PRODUCING THE SAME AND RESIST COMPOSITION CONTAINING THE HYPERBRANCHED POLYMER | Lion Corporation (JP) | 2006-09-06 | — | — | EP | disclosed |
| US-20050140881-A1 | Liquid crystal display device | FUJI PHOTO FILM CO., LTD. (JP) | 2005-06-30 | — | — | US | disclosed |
| EP-0823661-B1 | Composition for anti-reflective coating material | FUJI PHOTO FILM CO LTD (JP) | 2001-07-04 | — | — | EP | disclosed |
| US-6248500-B1 | ACRYLIC POLYMERS AND PHENOL, NAPHTHOL OR HYDROXYANTHRACENE COMPOUNDS | FUJI PHOTO FILM CO., LTD. (JP) | 2001-06-19 | — | — | US | disclosed |
| US-6090531-A | UNDERGOES NO INTERMIXING WITH THE RESIST LAYER, PROVIDES AN EXCELLENT RESIST PATTERN AND SHOWS A HIGHER DRY ETCHING RATE THAN RESIST AND A RESIST PATTERN FORMATION PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2000-07-18 | — | — | US | disclosed |
| EP-0823661-A1 | Composition for anti-reflective coating material | FUJI PHOTO FILM CO., LTD. (JP) | 1998-02-11 | — | — | EP | disclosed |
| US-5370982-A | Acid polymer as protective layer | FUJI PHOTO FILM CO., LTD. (JP) | 1994-12-06 | — | — | US | disclosed |
| EP-0048412-B1 | PHOTOGRAPHIC MATERIAL WITH A TEMPORARY BARRIER LAYER | Agfa-Gevaert AG (DE) | 1984-06-20 | — | — | EP | disclosed |