SCHEMBL4955015

SCHEMBL4955015

C=C(C(=O)OC)C(C=Cc1ccccc1)C=C(C)C(=O)O

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.43
AKR1C3 P42330 1/20 0.41
CYP3A4 P08684 5/20 0.40
TDP1 Q9NUW8 2/20 0.38
LMNA P02545 1/20 0.38
GLA P06280 1/20 0.37
CYP1A2 P05177 1/20 0.37
MAPT P10636 3/20 0.37
CYP2C9 P11712 3/20 0.37
CYP2C19 P33261 3/20 0.37
ALOX15 P16050 1/20 0.37
CYP2D6 P10635 2/20 0.36
TSHR P16473 1/20 0.36
CMA1 P23946 2/20 0.36
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
APEX1 P27695 1/20 0.35
CNR2 P34972 1/20 0.35
HPGD P15428 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL9169082 0.95 ALDH1A1 (0.39) ALDH1A1AKR1C3CYP3A4TDP1LMNA
SCHEMBL35752 0.90 ALDH1A1 (0.41) ALDH1A1TDP1LMNAMAPTMEN1
Acrylic Acid Ethyl Ester SCHEMBL5931095 0.88 ALDH1A1 (0.38) ALDH1A1LMNAMAPTMEN1KMT2A
SCHEMBL8741158 0.88 AKR1C3 (0.46) ALDH1A1AKR1C3CYP3A4TDP1LMNA
SCHEMBL10432156 0.86 TSHR (0.37) ALDH1A1AKR1C3CYP3A4TDP1LMNA
SCHEMBL35354 0.86 CASP1 (0.47) ALDH1A1AKR1C3CYP3A4TDP1LMNA
SCHEMBL10728503 0.86 LMNA (0.42) ALDH1A1CYP3A4TDP1LMNAGLA
SCHEMBL8943176 0.85 LMNA (0.46) ALDH1A1AKR1C3CYP3A4LMNAMAPT
Methacrylic Acid SCHEMBL4471743 0.82 ALDH1A1 (0.41) ALDH1A1CYP3A4TDP1LMNAGLA
SCHEMBL5418266 0.81 HDAC3 (0.45) ALDH1A1CYP3A4TDP1LMNAGLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10989843-B2 Transparent electrode-attached complex, transfer film, method for manufacturing transparent electrode-attached complex, and electrostatic capacitance-type input device FUJIFILM CORPORATION (JP) 2021-04-27 US disclosed
US-10471689-B2 2019-11-12 US disclosed
US-10209839-B2 Method for producing laminated material, laminated material, method for producing transparent laminate, transparent laminate, capacitance-type input device, and image display device FUJIFILM CORPORATION (JP) 2019-02-19 US disclosed
US-20180157171-A1 TRANSFER FILM, ELECTRODE PROTECTIVE FILM FOR ELECTROSTATIC CAPACITANCE-TYPE INPUT DEVICE, LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND ELECTROSTATIC CAPACITANCE-TYPE INPUT DEVICE FUJIFILM CORPORATION (JP) 2018-06-07 US disclosed
US-20180081087-A1 TRANSPARENT ELECTRODE-ATTACHED COMPLEX, TRANSFER FILM, METHOD FOR MANUFACTURING TRANSPARENT ELECTRODE-ATTACHED COMPLEX, AND ELECTROSTATIC CAPACITANCE-TYPE INPUT DEVICE FUJIFILM CORPORATION (JP) 2018-03-22 US disclosed
US-20170115778-A1 METHOD FOR PRODUCING LAMINATED MATERIAL, LAMINATED MATERIAL, METHOD FOR PRODUCING TRANSPARENT LAMINATE, TRANSPARENT LAMINATE, CAPACITANCE-TYPE INPUT DEVICE, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2017-04-27 US disclosed
US-9268451-B2 Transfer film, manufacturing method of capacitive input device, capacitive input device, and image display device including the same FUJIFILM CORPORATION (JP) 2016-02-23 US disclosed
US-20160039188-A1 TRANSFER MATERIAL, SUBSTRATE WITH TRANSFER LAYER, TOUCH PANEL, MANUFACTURING METHODS THEREFOR, AND INFORMATION DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2016-02-11 US disclosed
US-20150251393-A1 TRANSFER FILM, TRANSPARENT LAMINATE, METHOD FOR PRODUCING TRANSFER FILM, METHOD FOR PRODUCING TRANSPARENT LAMINATE, CAPACITIVE INPUT DEVICE, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2015-09-10 US disclosed
CN-104756052-A Decorative material-attached base material, method for manufacturing same, touch panel, and information display device FUJIFILM CORP 2015-07-01 CN disclosed
CN-1950750-A Pattern forming material, pattern forming apparatus, and pattern forming method FUJI PHOTO FILM CO LTD (JP) 2007-04-18 CN disclosed
WO-2007032552-A1 PHOTOSENSITIVE COMPOSITION, TRANSFER MATERIAL, LIGHT SHIELDING FILM AND PRODUCTION METHOD THEREOF, COLOR FILTER FOR DISPLAY DEVICE, SUBSTRATE FOR DISPLAY DEVICE, AND DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2007-03-22 WO disclosed
US-7045257-B2 Black matrix and method for manufacturing the same FUJI PHOTO FILM CO., LTD. (JP) 2006-05-16 US disclosed
US-20050175933-A1 Light shielding film for display device, production process thereof, metal-particle-containing composition, photosensitive transfer material, substrate for display device, and color filter FUJI PHOTO FILM CO., LTD. 2005-08-11 US disclosed
CN-1651992-A Light shielding film for display device, production process thereof, metal-particle-containing composition FUJI PHOTO FILM CO LTD (JP) 2005-08-10 CN disclosed
US-20040257502-A1 Light-shielding layer for display device FUJI PHOTO FILM CO., LTD. 2004-12-23 US disclosed
US-20040209184-A1 Black matrix and method for manufacturing the same FUJI PHOTO FILM CO., LTD. 2004-10-21 US disclosed
US-5998124-A SILVER HALIDE GRAINS HAVING A SILVER CHLORIDE CONTENT OF 50 MOL % OR MORE AND AT LEAST 30% OF THE SURFACE AREA OF THE GRAINS COMPRISING (111) FACES FORMED IN THE PRESENCE OF A QUATERNARY PYRIDINIUM SALT FUJI PHOTO FILM CO., LTD. (JP) 1999-12-07 US disclosed
EP-0723187-B1 Production method of photographic silver halide emulsion FUJI PHOTO FILM CO LTD (JP) 1999-04-07 EP disclosed
EP-0723187-A1 Production method of photographic silver halide emulsion FUJI PHOTO FILM CO., LTD. (JP) 1996-07-24 EP disclosed