SCHEMBL4955548

SCHEMBL4955548

O=[N+]([O-])c1ccc(NCNc2ccc([N+](=O)[O-])cc2)cc1

nearest known ligand 0.70

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.70
ALDH1A1 P00352 4/20 0.59
RECQL P46063 1/20 0.59
HSD17B10 Q99714 1/20 0.59
PTPRF P10586 1/20 0.56
PTPN2 P17706 1/20 0.56
PTPN1 P18031 1/20 0.56
PTPN11 Q06124 1/20 0.56
MEN1 O00255 2/20 0.55
KMT2A Q03164 2/20 0.55
HPGD P15428 2/20 0.55
ALOX12 P18054 2/20 0.55
L3MBTL1 Q9Y468 1/20 0.55
GLA P06280 2/20 0.53
SMN1; SMN2 Q16637 2/20 0.53
IDO1 P14902 1/20 0.53
CA1 P00915 1/20 0.52
CA2 P00918 1/20 0.52
ALOX5 P09917 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9003269 0.86 MAPT (0.70) MAPTALDH1A1RECQLHSD17B10PTPRF
SCHEMBL6251043 0.83 MAPT (0.66) MAPTALDH1A1RECQLHSD17B10PTPRF
SCHEMBL4951837 0.83 ALDH1A1 (0.73) MAPTALDH1A1RECQLHSD17B10PTPRF
SCHEMBL570831 0.83 MAPT (1.00) MAPTALDH1A1RECQLHSD17B10PTPRF
SCHEMBL13519848 0.83 MAPT (0.66) MAPTALDH1A1RECQLHSD17B10PTPRF
SCHEMBL16306796 0.83 MAPT (0.66) MAPTALDH1A1RECQLHSD17B10PTPRF
SCHEMBL14117517 0.81 ALDH1A1 (0.66) MAPTALDH1A1RECQLHSD17B10PTPRF
SCHEMBL4953680 0.81 PTPRF (0.83) MAPTALDH1A1PTPRFPTPN2PTPN1
Hydrochloric Acid SCHEMBL1405413 0.81 MAPT (0.96) MAPTALDH1A1RECQLHSD17B10PTPRF
SCHEMBL9472351 0.81 MAPT (0.63) MAPTALDH1A1RECQLHSD17B10PTPRF

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2056526-A None JP disclosed
EP-1944332-B1 Method of modifying surface layer of molded resin NAT INST OF ADVANCED IND SCIEN (JP) 2012-08-08 EP disclosed
EP-1944332-A2 Modification method of surface layer of molded resin article, and modification apparatus of surface layer of molded resin article National Institute of Advanced Industrial Science and Technology (JP) 2008-07-16 EP disclosed
US-7262252-B2 Nonlinear optical materials comprising fluorine-containing polymer DAIKIN INDUSTRIES, LTD. (JP) 2007-08-28 US disclosed
US-20060156986-A1 Modification method of surface layer of molded resin article, and modification apparatus of surface layer of molded resin article NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2006-07-20 US disclosed
US-7078072-B1 Method of modifying surface layer of molded resin and apparatus for modifying surface layer of molded resin NATIONAL INSTITUE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2006-07-18 US disclosed
US-7041332-B2 Modification method of surface layer of molded resin article, and modification apparatus of surface layer of molded resin article NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2006-05-09 US disclosed
US-20050004253-A1 Nonlinear optical materials comprising fluorine-containing polymer DAIKIN INDUSTRIES, LTD 2005-01-06 US disclosed
US-20040195206-A1 Modification method of surface layer of molded resin article, and modification apparatus of surface layer of molded resin article NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2004-10-07 US disclosed
EP-1406116-A1 NONLINEAR OPTICAL MATERIAL CONTAINING FLUOROPOLYMER Daikin Industries, Ltd. (JP) 2004-04-07 EP disclosed
EP-0854024-B1 Thin-film fabrication method and apparatus NAT INST OF ADVANCED IND SCIEN (JP) 2002-09-18 EP disclosed
EP-1179558-A1 METHOD OF MODIFYING SURFACE LAYER OF MOLDED RESIN AND APPARATUS FOR MODIFYING SURFACE LAYER OF MOLDED RESIN Japan as represented by Secretary of Agency of Industrial Science and Technology (JP) 2002-02-13 EP disclosed
US-6319321-B1 Thin-film fabrication method and apparatus AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY MINISTRY OF INTERNATIONAL TRADE & INDUSTRY (JP) 2001-11-20 US disclosed
EP-0854024-A2 Thin-film fabrication method and apparatus Agency of Industrial Science and Technology of Ministry of International Trade and Industry (JP) 1998-07-22 EP disclosed
EP-0355326-B1 Nonlinear optical material SUMITOMO BAKELITE CO (JP) 1993-10-27 EP disclosed
US-5110988-A N-methoxymethyl-4-nitroaniline SUMITOMO BAKELITE COMPANY LIMITED (JP) 1992-05-05 US disclosed
EP-0355326-A2 Nonlinear optical material SUMITOMO BAKELITE COMPANY LIMITED (JP) 1990-02-28 EP disclosed
JP-H0256526-A ORGANIC NONLINEAR OPTICAL MATERIAL AND COMPOSITION MIYATA SEIZO 1990-02-26 JP disclosed