Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR6 | P50406 | 4/20 | 0.52 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.46 |
| ▸ | POLB | P06746 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | HTR2C | P28335 | 1/20 | 0.42 |
| ▸ | HTR2B | P41595 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | PKM | P14618 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | PNMT | P11086 | 1/20 | 0.41 |
| ▸ | TYMS | P04818 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | FEN1 | P39748 | 1/20 | 0.40 |
| ▸ | LOX | P28300 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29357601 | 0.92 | ALDH1A1 (0.50) | HTR6ALOX15TDP1ALDH1A1SMN1; SMN2 | |
| SCHEMBL209746 | 0.92 | ALDH1A1 (0.50) | HTR6ALOX15TDP1ALDH1A1SMN1; SMN2 | |
| (Phenylsulfonyl)Benzene SCHEMBL424799 | 0.86 | TDP1 (0.64) | HTR6ALOX15TDP1ALDH1A1SMN1; SMN2 | |
| SCHEMBL18503879 | 0.84 | HTR6 (0.47) | HTR6TDP1ALDH1A1SMN1; SMN2POLB | |
| SCHEMBL9516335 | 0.82 | F2 (0.49) | TDP1ALDH1A1POLBMAPTL3MBTL1 | |
| SCHEMBL12833339 | 0.82 | ALDH1A1 (0.42) | ALOX15TDP1ALDH1A1SMN1; SMN2POLB | |
| SCHEMBL26189849 | 0.82 | ALDH1A1 (0.42) | ALOX15TDP1ALDH1A1SMN1; SMN2POLB | |
| SCHEMBL24636740 | 0.82 | CA12 (0.43) | HTR6ALOX15TDP1ALDH1A1SMN1; SMN2 | |
| SCHEMBL13883830 | 0.81 | ALDH1A1 (0.41) | ALOX15TDP1ALDH1A1SMN1; SMN2POLB | |
| SCHEMBL3269796 | 0.80 | POLB (0.50) | ALDH1A1POLBL3MBTL1TSHRTYMS |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022198402-A1 | ELECTROLYTE, ELECTROCHEMICAL DEVICE AND ELECTRONIC DEVICE | 宁德新能源科技有限公司 | 2022-09-29 | — | — | WO | disclosed |
| US-9910354-B2 | Resist underlayer film-forming composition and method for forming resist pattern using the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-03-06 | — | — | US | disclosed |
| US-9910354-B2 | Resist underlayer film-forming composition and method for forming resist pattern using the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-03-06 | — | — | US | disclosed |
| US-20170045820-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-02-16 | — | — | US | disclosed |
| US-20170045820-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-02-16 | — | — | US | disclosed |
| EP-1321487-B1 | POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE | MITSUI CHEMICALS INC (JP) | 2008-02-27 | — | — | EP | disclosed |
| US-6734276-B2 | RANDOM COPOLYMER WITH UNITS DERIVED FROM PYROMELLITIC ACID, P-PHENYLENEDIAMINE, AND AT LEAST ONE OF M-PHENYLENEDIAMINE, BIS(P-AMINOPHENYL) ETHER, AND DIAMINOMETHYLNORBORNANE; LINEAR EXPANSION COEFFICIENT; SHRINKAGE INHIBITION | MITSUI CHEMICALS, INC. (JP) | 2004-05-11 | — | — | US | disclosed |
| US-6710160-B2 | VARNISH HAVING IMPROVED SMOOTHNESS, THERMAL RESISTANCE, MELT FLOWABILITY, OPTICAL PROPERTIES AND CHEMICAL RESISTANCE; DIELECTRICS | MITSUI CHEMICALS, INC. (JP) | 2004-03-23 | — | — | US | disclosed |
| EP-1321487-A1 | POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE | Mitsui Chemicals, Inc. (JP) | 2003-06-25 | — | — | EP | disclosed |
| US-20030064235-A1 | Optical members made of polymide resins | MITSUI CHEMICALS, INC. (JP) | 2003-04-03 | — | — | US | disclosed |
| CN-1388904-A | Polyimide resin optical element | MITSUI CHEMICALS INC (JP) | 2003-01-01 | — | — | CN | disclosed |
| US-20020188090-A1 | Polyamic acid, polyimide, process for producing these, and film of the polyimide | MITSUI CHEMICALS, INC. (JP) | 2002-12-12 | — | — | US | disclosed |
| EP-1236756-A1 | NOVEL POLYIMIDE AND CIRCUIT SUBSTRATE COMPRISING THE SAME | Mitsui Chemicals, Inc. (JP) | 2002-09-04 | — | — | EP | disclosed |
| EP-1237015-A1 | OPTICAL MEMBERS MADE OF POLYIMIDE RESINS | Mitsui Chemicals, Inc. (JP) | 2002-09-04 | — | — | EP | disclosed |
| US-6316170-B2 | COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-11-13 | — | — | US | disclosed |
| US-20010006767-A1 | Developing solution and method of forming polyimide pattern by using the developing solution | YOSHIAKI KAWAMONZEN | 2001-07-05 | — | — | US | disclosed |
| US-6183934-B1 | FOE USE IN FORMATION OF PATTERN OF INSULATION FILM, PASSIVATION FILM, .ALPHA.-RAY SHIELDING FILM, OPTICAL WAVEGUIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-02-06 | — | — | US | disclosed |
| US-6001517-A | A THERMOSETTING POLYMER WHICH CAN BE CURED THROUGH CYCLODEHYDRATION UPON HEATING AND A CURE ACCELERATOR WHICH CAN BE DEACTIVATED OF ITS CURE ACCELERATION PROPERTY BY IRRIDIATION OF LIGHT | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-12-14 | — | — | US | disclosed |
| US-5530130-A | DYEING PLASTICS | BAYER AKTIENGESELLSCHAFT (DE) | 1996-06-25 | — | — | US | disclosed |
| EP-0639624-A1 | Phthaloperinone dyestuffs | BAYER AG (DE) | 1995-02-22 | — | — | EP | disclosed |