SCHEMBL496528

SCHEMBL496528

C=CC[SiH2]OC(C)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid Methyl Ester SCHEMBL29045286 0.94 ALDH1A1 (0.42)
SCHEMBL3383717 0.78
SCHEMBL170414 0.76
SCHEMBL545211 0.76 TSHR (0.36)
SCHEMBL2284390 0.73 TSHR (0.34)
SCHEMBL2290076 0.70 TSHR (0.31)
SCHEMBL49603 0.69
SCHEMBL10721004 0.68
SCHEMBL49831 0.67
Butadiene SCHEMBL17498997 0.67 ALDH1A1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 227 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2639854-B1 Separator for lithium secondary battery SAMSUNG SDI CO LTD (KR) 2020-05-06 EP claimed
EP-2639854-A1 Separator for lithium secondary battery SAMSUNG SDI CO., LTD. (KR) 2013-09-18 EP claimed
US-7915181-B2 Repair and restoration of damaged dielectric materials and films HONEYWELL INTERNATIONAL INC. (US) 2011-03-29 US claimed
US-7875347-B2 dielectric layer comprises a thermosetting polymer and a nanosized filler; can withstand higher voltages while have reduced thickness when compared with insulation that is made from multilayered materials GENERAL ELECTRIC COMPANY (US) 2011-01-25 US claimed
US-7803457-B2 Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom GENERAL ELECTRIC COMPANY (US) 2010-09-28 US claimed
US-20090182088-A9 Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom IRWIN PATRICIA C 2009-07-16 US claimed
US-7500397-B2 Activated chemical process for enhancing material properties of dielectric films AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-03-10 US claimed
US-7435074-B2 Method for fabricating dual damascence structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascence patterning INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2008-10-14 US claimed
US-20080199977-A1 Activated Chemical Process for Enhancing Material Properties of Dielectric Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2008-08-21 US claimed
EP-1959485-A2 Activated chemical process for enhancing material properties of dielectric films Air Products and Chemicals, Inc. (US) 2008-08-20 EP claimed
EP-1150642-B1 EXPENDABLE IMPRESSION TRAY WITH ADHESIVE COATING S & C POLYMER SILICON & COMPOS (DE) 2003-05-02 EP claimed
US-6518205-B1 Multifunctional reagents for the surface modification of nanoporous silica films ALLIEDSIGNAL INC. 2003-02-11 US claimed
US-20030008250-A1 Method for preparing a silver halide photographic emulsion EASTMAN KODAK COMPANY 2003-01-09 US claimed
EP-1245999-A1 Method for preparing a silver halide photographic emulsion EASTMAN KODAK COMPANY (US) 2002-10-02 EP claimed
US-6208014-B1 HYDROPHOBIC DIELECTRIC FILM PRODUCED BY REACTING A HYDROPHILIC SILICA FILM WITH A MULTIFUNCTIONAL SURFACE MODIFICATION AGENT THAT IS CAPABLE OF SILYLATING OR CAPPING SILANOL MOIETIES ON HYDROPHILIC SURFACES ALLIEDSIGNAL, INC. 2001-03-27 US claimed
EP-0337000-B1 Reactive posttreatment for gas separation membranes AIR LIQUIDE (FR) 1997-06-25 EP claimed
EP-0337000-A2 Reactive posttreatment for gas separation membranes L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 1989-10-18 EP claimed
US-4863496-A POLYMERIZING MONOMER TO IMPROVE PERMSELECTIVITY E. I. DU PONT DE NEMOURS AND CO. (US) 1989-09-05 US claimed
US-4595610-A Mixing reaction product of an organosilicon resin, a polyorganohydrogensiloxane, polydiorganosiloxane, filler, organotin catalyst DOW CORNING CORPORATION (US) 1986-06-17 US claimed
EP-0167307-A2 Curable silicone compositions for the protection of polyurethane foam DOW CORNING CORPORATION (US) 1986-01-08 EP claimed