Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 2/20 | 0.45 |
| ▸ | MEN1 | O00255 | 2/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 9/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.43 |
| ▸ | HPGD | P15428 | 5/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.43 |
| ▸ | CA12 | O43570 | 2/20 | 0.43 |
| ▸ | CA2 | P00918 | 2/20 | 0.43 |
| ▸ | CA4 | P22748 | 2/20 | 0.43 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.43 |
| ▸ | CA1 | P00915 | 2/20 | 0.43 |
| ▸ | CA9 | Q16790 | 2/20 | 0.43 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.43 |
| ▸ | CA6 | P23280 | 1/20 | 0.43 |
| ▸ | CA7 | P43166 | 1/20 | 0.43 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 4/20 | 0.42 |
| ▸ | LMNA | P02545 | 3/20 | 0.42 |
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7102004 | 0.85 | MAOA (0.41) | ALDH1A1TSHRHSD17B10HTTTDP1 | |
| SCHEMBL9627138 | 0.83 | SMN1; SMN2 (0.46) | NPC1MEN1KMT2AKDM4EALDH1A1 | |
| SCHEMBL9627636 | 0.79 | NAAA (0.46) | NPC1MEN1KMT2AKDM4EALDH1A1 | |
| SCHEMBL8686410 | 0.78 | MEN1 (0.47) | NPC1MEN1KMT2AKDM4EALDH1A1 | |
| SCHEMBL7923699 | 0.78 | NAAA (0.49) | NPC1MEN1KMT2AKDM4EALDH1A1 | |
| SCHEMBL2313481 | 0.77 | MAOA (0.58) | KMT2AHPGDSMN1; SMN2TSHRHTT | |
| SCHEMBL9626588 | 0.77 | NPC1 (0.41) | NPC1MEN1KMT2AKDM4EALDH1A1 | |
| SCHEMBL4541375 | 0.76 | MEN1 (0.48) | NPC1MEN1KMT2AKDM4EALDH1A1 | |
| SCHEMBL4541373 | 0.76 | MEN1 (0.48) | NPC1MEN1KMT2AKDM4EALDH1A1 | |
| SCHEMBL24385024 | 0.76 | ALDH1A1 (0.48) | NPC1MEN1KMT2AKDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 232 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4637964-A | MAGNETIC TAPES, UNSATURATED PHENOL MONOMER | MITSUI TOATSU CHEMICALS, INC. (JP) | 1987-01-20 | — | — | US | claimed |
| CN-122070516-A | Negative photosensitive composition, photosensitive resist film, method for producing hollow structure, and method for forming pattern | 东京应化工业株式会社 | 2026-05-19 | — | — | CN | disclosed |
| CN-120065622-A | Photosensitive resin composition and method for producing microlens | 东京应化工业株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-119977851-A | Sulfonyl imide salt photoacid generator and application thereof in photoresist | 杭州先研科技有限公司 | 2025-05-13 | — | — | CN | disclosed |
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| CN-114503030-B | Negative photosensitive resin composition, photosensitive resist film, pattern forming method, cured film, manufacturing method, and roll | 东京应化工业株式会社 | 2025-03-11 | — | — | CN | disclosed |
| CN-119511633-A | Photosensitive resin composition and preparation method and application thereof | 广东聚石科技研究院有限公司 | 2025-02-25 | — | — | CN | disclosed |
| CN-118829948-A | Method for manufacturing plating shaped article | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-110317174-B | Hydrogen barrier agent, composition for forming hydrogen barrier film, method for producing hydrogen barrier film, and electronic device | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-118742854-A | Chemically amplified positive photosensitive composition, method for producing molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2024-10-01 | — | — | CN | disclosed |
| EP-0400642-A2 | Electrically conductive paste composition | KAO CORPORATION (JP) | 1990-12-05 | — | — | EP | disclosed |
| US-4810814-A | Preparation of cyanoalkylphenols | THE DOW CHEMICAL COMPANY (US) | 1989-03-07 | — | — | US | disclosed |
| EP-0226009-A2 | Photoresist compositions of controlled dissolution rate in alkaline developers | International Business Machines Corporation (US) | 1987-06-24 | — | — | EP | disclosed |
| US-4637964-A | MAGNETIC TAPES, UNSATURATED PHENOL MONOMER | MITSUI TOATSU CHEMICALS, INC. (JP) | 1987-01-20 | — | — | US | disclosed |
| EP-0202458-A2 | Cross-linked polyalkenyl phenol based photoresist compositions | International Business Machines Corporation (US) | 1986-11-26 | — | — | EP | disclosed |
| US-4600683-A | Cross-linked polyalkenyl phenol based photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 1986-07-15 | — | — | US | disclosed |
| US-4298720-A | HEAT RESISTANT MOLDING MATERIALS AND VULCANIZATION ACCELERATORS | MITSUI TOATSU CHEMICALS INCORPORATED (JP) | 1981-11-03 | — | — | US | disclosed |
| US-4221700-A | POLY(ALKYLATED ALKENYLPHENOL); POLYESTERS OF ALKYLTHIOALKANOIC ACIDS OR ORGANIC PHOSPHITE | MARUZEN OIL CO., LTD. (JP) | 1980-09-09 | — | — | US | disclosed |
| US-4035559-A | CROSSLINKING AGENT | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1977-07-12 | — | — | US | disclosed |
| US-4032513-A | PROCESS OF PRODUCING ALKENYLPHENOL POLYMERS | MARUZEN OIL CO. LTD. (JA) | 1977-06-28 | — | — | US | disclosed |