Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 3/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.44 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.44 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.44 |
| ▸ | HTR2A | P28223 | 1/20 | 0.44 |
| ▸ | HTR2C | P28335 | 1/20 | 0.44 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.44 |
| ▸ | HRH1 | P35367 | 1/20 | 0.44 |
| ▸ | DRD3 | P35462 | 1/20 | 0.44 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.44 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.44 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.44 |
| ▸ | SLC1A3 | P43003 | 2/20 | 0.42 |
| ▸ | SLC1A2 | P43004 | 2/20 | 0.42 |
| ▸ | SLC1A1 | P43005 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | ALPL | P05186 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3283999 | 0.88 | CA2 (0.55) | CA2MAPK1TDP1CHRM1AKR1A1 | |
| SCHEMBL3285540 | 0.85 | TDP1 (0.60) | CA2MAPK1HSD17B10TDP1CHRM1 | |
| SCHEMBL11594016 | 0.85 | MAPK1 (0.42) | CA2MAPK1HSD17B10TDP1CHRM1 | |
| SCHEMBL11412731 | 0.83 | CA2 (0.41) | CA2MAPK1HSD17B10TDP1CHRM1 | |
| SCHEMBL60732 | 0.82 | CA2 (0.46) | CA2MAPK1TDP1CHRM1AKR1A1 | |
| SCHEMBL169923 | 0.82 | CA2 (0.46) | CA2MAPK1TDP1CHRM1AKR1A1 | |
| SCHEMBL3284430 | 0.82 | CA2 (0.59) | CA2MAPK1HSD17B10TDP1CHRM1 | |
| SCHEMBL28388040 | 0.82 | MEN1 (0.42) | CA2MAPK1TDP1CHRM1AKR1A1 | |
| SCHEMBL25046804 | 0.81 | CA2 (0.50) | CA2MAPK1HSD17B10TDP1SLC1A3 | |
| SCHEMBL22108769 | 0.80 | HSD17B10 (0.41) | CA2MAPK1HSD17B10TDP1CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115707794-A | Surface-binding agent and method for treating substrate surface | 柏群科技有限公司 | 2023-02-21 | — | — | CN | disclosed |
| US-10961422-B2 | Surface treatment liquid, surface treatment method, and method for suppressing pattern collapse | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-03-30 | — | — | US | disclosed |
| EP-3514145-A1 | IMIDAZOLE COMPOUND, METAL SURFACE TREATMENT LIQUID, METAL SURFACE TREATMENT METHOD, AND LAMINATE PRODUCTION METHOD | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2019-07-24 | — | — | EP | disclosed |
| US-10336708-B2 | Imidazole compound, metal surface treatment liquid, metal surface treatment method, and laminate production method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-02 | — | — | US | disclosed |
| US-20190194512-A1 | SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, AND METHOD FOR SUPPRESSING PATTERN COLLAPSE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-06-27 | — | — | US | disclosed |
| EP-3184511-B1 | IMIDAZOLE COMPOUND, METAL SURFACE TREATMENT LIQUID, METAL SURFACE TREATMENT METHOD, AND LAMINATE PRODUCTION METHOD | TOKYO OHKA KOGYO CO LTD (JP) | 2019-03-20 | — | — | EP | disclosed |
| US-20170247334-A1 | IMIDAZOLE COMPOUND, METAL SURFACE TREATMENT LIQUID, METAL SURFACE TREATMENT METHOD, AND LAMINATE PRODUCTION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-08-31 | — | — | US | disclosed |
| EP-3184511-A1 | IMIDAZOLE COMPOUND, METAL SURFACE TREATMENT LIQUID, METAL SURFACE TREATMENT METHOD, AND LAMINATE PRODUCTION METHOD | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2017-06-28 | — | — | EP | disclosed |
| US-8105763-B2 | Method of forming plated product using negative photoresist composition and photosensitive composition used therein | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-7932221-B2 | Solvent for cleaning | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-26 | — | — | US | disclosed |
| US-20070190454-A1 | PHOTORESIST COMPOSITION, METHOD OF PATTERNING THIN FILM USING THE SAME, AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY PANEL USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-16 | — | — | US | disclosed |
| EP-1761823-A1 | METHOD OF FORMING PLATED PRODUCT USING NEGATIVE PHOTORESIST COMPOSITION AND PHOTOSENSITIVE COMPOSITION USED THEREIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-03-14 | — | — | EP | disclosed |
| WO-2006003757-A1 | METHOD OF FORMING PLATED PRODUCT USING NEGATIVE PHOTORESIST COMPOSITION AND PHOTOSENSITIVE COMPOSITION USED THEREIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-01-12 | — | — | WO | disclosed |
| US-6641628-B1 | Plastic particles are acrylonitrile/polyethylene chloride/styrene resin particles | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-11-04 | — | — | US | disclosed |
| EP-0890417-B1 | Method for sandblast processing plasma display panel substrate using a plastic abrasive | TOKYO OHKA KOGYO CO LTD (JP) | 2003-05-07 | — | — | EP | disclosed |
| US-6368195-B1 | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-04-09 | — | — | US | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |
| US-6126513-A | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-10-03 | — | — | US | disclosed |
| US-6071673-A | Method for the formation of resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-06-06 | — | — | US | disclosed |
| EP-0890417-A1 | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-01-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10336708-B2 | Imidazole compound, metal surface treatment liquid, metal surface treatment method, and laminate production method | FASN, SLC27A1, SLC27A2 | CA2 1744/4885MAPK1 2260/4885HSD17B10 555/4885 |
| US-20170247334-A1 | IMIDAZOLE COMPOUND, METAL SURFACE TREATMENT LIQUID, METAL SURFACE TREATMENT METHOD, AND LAMINATE PRODUCTION METHOD | FASN, SLC27A1, SLC27A2 | CA2 1744/4885MAPK1 2260/4885HSD17B10 555/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.