Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 3/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.53 |
| ▸ | HSPD1 | P10809 | 2/20 | 0.53 |
| ▸ | HSPE1 | P61604 | 2/20 | 0.53 |
| ▸ | PKM | P14618 | 2/20 | 0.53 |
| ▸ | F3 | P13726 | 2/20 | 0.53 |
| ▸ | MEN1 | O00255 | 2/20 | 0.53 |
| ▸ | MAPT | P10636 | 2/20 | 0.53 |
| ▸ | MAOA | P21397 | 2/20 | 0.53 |
| ▸ | MAOB | P27338 | 2/20 | 0.53 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.53 |
| ▸ | RAB9A | P51151 | 1/20 | 0.53 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.53 |
| ▸ | RELA | Q04206 | 1/20 | 0.53 |
| ▸ | ALDH2 | P05091 | 1/20 | 0.53 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.53 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.53 |
| ▸ | ESR1 | P03372 | 4/20 | 0.52 |
| ▸ | TYR | P14679 | 3/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29382 | 0.90 | ALDH1A1 (0.61) | CYP3A4TDP1F3MAPTMAOB | |
| SCHEMBL3084338 | 0.90 | ALDH1A1 (0.61) | CYP3A4TDP1F3MAPTMAOB | |
| SCHEMBL23457945 | 0.90 | ALDH1A1 (0.61) | CYP3A4TDP1F3MAPTMAOB | |
| SCHEMBL6895682 | 0.85 | MAPT (0.60) | CYP3A4KMT2ATDP1F3MAPT | |
| SCHEMBL23457954 | 0.85 | MAPT (0.60) | CYP3A4KMT2ATDP1F3MAPT | |
| SCHEMBL23458038 | 0.85 | MAPT (0.60) | CYP3A4KMT2ATDP1F3MAPT | |
| SCHEMBL5438537 | 0.85 | MAPT (0.60) | CYP3A4KMT2ATDP1F3MAPT | |
| SCHEMBL2622602 | 0.83 | NFE2L2 (0.61) | TDP1F3MAPTMAOAMAOB | |
| SCHEMBL2632275 | 0.83 | ALDH1A1 (0.50) | TDP1F3MAPTMAOAMAOB | |
| SCHEMBL12319437 | 0.83 | CYP19A1 (0.61) | KMT2ATDP1F3MEN1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8105763-B2 | Method of forming plated product using negative photoresist composition and photosensitive composition used therein | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-7879525-B2 | A photoresist comprising a resin that undergoes a change in alkali solubility by an acid, an acid generating compound and a corrosion inhibitor, e.g. trimercapto-1,3,5-triazine; stabiliity prior to development; used in the manufacturing of connection terminals during the mounting of semiconductors | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-02-01 | — | — | US | disclosed |
| US-20080032242-A1 | Method of Forming Plated Product Using Negative Photoresist Composition and Photosensitive Composition Used Therein | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-02-07 | — | — | US | disclosed |
| US-20070275320-A1 | Chemically Amplified Photorestist Composition, Laminated Product, and Connection Element | HITACHI CONSTRUCTION MACHINERY CO., LTD. (JP) | 2007-11-29 | — | — | US | disclosed |
| EP-1761823-A1 | METHOD OF FORMING PLATED PRODUCT USING NEGATIVE PHOTORESIST COMPOSITION AND PHOTOSENSITIVE COMPOSITION USED THEREIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-03-14 | — | — | EP | disclosed |
| WO-2006003757-A1 | METHOD OF FORMING PLATED PRODUCT USING NEGATIVE PHOTORESIST COMPOSITION AND PHOTOSENSITIVE COMPOSITION USED THEREIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-01-12 | — | — | WO | disclosed |
| US-5955241-A | Chemical-amplification-type negative resist composition and method for forming negative resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-09-21 | — | — | US | disclosed |