SCHEMBL499105

SCHEMBL499105

NC(=O)CCC(=O)NC=O

nearest known ligand 0.33

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.32
KDM5C P41229 1/20 0.32
PHF8 Q9UPP1 1/20 0.32
KDM2A Q9Y2K7 1/20 0.32
KMT2A Q03164 2/20 0.30
MEN1 O00255 1/20 0.30
FAAH O00519 1/20 0.30
TP53 P04637 1/20 0.30
CYP1A2 P05177 1/20 0.30
CYP3A4 P08684 1/20 0.30
CYP2C19 P33261 1/20 0.30
SOAT1 P35610 1/20 0.30
ALOX15 P16050 1/20 0.30
BLM P54132 1/20 0.30
PMP22 Q01453 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23367664 0.79
SCHEMBL223004 0.78 ALDH1A1 (0.33) KDM4EKDM5CPHF8KDM2A
SCHEMBL7326662 0.77 PHF8 (0.52) KDM4EKDM5CPHF8KDM2A
SCHEMBL8677956 0.77
Succinamide SCHEMBL27533694 0.76 CYP3A4 (0.35) KDM4EKMT2AMEN1FAAHTP53
SCHEMBL13778532 0.75 MEN1 (0.31) KMT2AMEN1FAAHTP53CYP1A2
SCHEMBL6053031 0.75 POLB (0.31) KMT2AMEN1FAAHTP53CYP1A2
Formamide SCHEMBL28093851 0.73 FOLH1 (0.48) KDM4EKDM5CPHF8KDM2ACYP3A4
SCHEMBL6963201 0.72
Succinamide SCHEMBL30781754 0.72 KDM4E (0.39) KDM4EKMT2AMEN1FAAHTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 198 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8029970-B2 Composition for manufacturing barrier rib, and plasma display panel manufactured by the same SAMSUNG SDI CO., LTD. (KR) 2011-10-04 US claimed
US-20080290314-A1 COMPOSITION FOR MANUFACTURING BARRIER RIB, AND PLASMA DISPLAY PANEL MANUFACTURED BY THE SAME SAMSUNG SDI CO., LTD. (KR) 2008-11-27 US claimed
CN-1208187-C Casting mould for producing ceramic green-pressing sheet LINTEC CO LTD (JP) 2005-06-29 CN claimed
US-20240230952-A1 LAMINATE AND METHOD FOR MANUFACTURING LAMINATE FUJIFILM CORPORATION (JP) 2024-07-11 US disclosed
EP-3597670-B1 WATER-SOLUBLE COMPOSITION, PRODUCTION METHOD FOR CURED PRODUCT THEREOF, AND CURED PRODUCT THEREOF, AND ACYL PHOSPHINATE ADEKA CORP (JP) 2024-07-10 EP disclosed
CN-112041739-B Liquid crystal light modulation element 日产化学株式会社 2024-06-11 CN disclosed
CN-117916082-A Laminate and method for producing laminate 富士胶片株式会社 2024-04-19 CN disclosed
CN-107689333-B Semiconductor package and method of forming the same 台湾积体电路制造股份有限公司 2023-11-21 CN disclosed
US-20230324739-A1 COMPOSITION FOR COLOR CONVERSION FILM, COLOR CONVERSION FILM, METHOD FOR MANUFACTURING COLOR CONVERSION FILM, BACKLIGHT UNIT, AND LIQUID CRYSTAL DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-10-12 US disclosed
CN-110036343-B Water-soluble composition, pattern forming agent, method for producing cured product using same, and cured product 株式会社ADEKA 2023-06-13 CN disclosed
US-11649334-B2 Water-soluble composition, production method for cured product thereof, and cured product thereof, and acyl phosphinate ADEKA CORPORATION (JP) 2023-05-16 US disclosed
US-5908730-A Chemical-sensitization photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1999-06-01 US disclosed
US-5902713-A Chemical-sensitization photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1999-05-11 US disclosed
US-5892095-A Cyano group-containing oxime sulfonate compounds TOKYO OHKA KOGYO CO., LTD. (JP) 1999-04-06 US disclosed
US-5800964-A Photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1998-09-01 US disclosed
EP-0848289-A1 Negative-working chemical sensitization photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1998-06-17 EP disclosed
EP-0821274-A1 Chemical-sensitization resist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1998-01-28 EP disclosed
US-5700625-A Negative-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1997-12-23 US disclosed
EP-0780729-A1 Chemical-sensitization photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1997-06-25 EP disclosed
EP-0768572-A1 Photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1997-04-16 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11649334-B2 Water-soluble composition, production method for cured product thereof, and cured product thereof, and acyl phosphinate PHOSPHO1, ASS1, SGMS1 KDM4E 2006/4885KDM5C 703/4885PHF8 532/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.