Known targets — ChEMBL curated mechanism
ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol
The experimentally established mechanism targets of Hydrogen Sulfide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL27880784 | 0.95 | — | — | |
| SCHEMBL128169 | 0.94 | — | — | |
| SCHEMBL246838 | 0.94 | CA2 (0.58) | — | |
| SCHEMBL105 | 0.94 | — | — | |
| SCHEMBL15109974 | 0.94 | — | — | |
| SCHEMBL25599 | 0.94 | CA2 (0.58) | — | |
| SCHEMBL8596055 | 0.94 | CA2 (0.58) | — | |
| Tetramethylammonium Ion SCHEMBL241976 | 0.91 | CA2 (0.47) | — | |
| SCHEMBL587727 | 0.89 | — | — | |
| SCHEMBL20570028 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110554569-B | Resist composition and patterning method | 信越化学工业株式会社 | 2024-01-16 | — | — | CN | disclosed |
| US-11435665-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-09-06 | — | — | US | disclosed |
| US-20200341373-A1 | Lithographic Method, Lithographic Product and Lithographic Material | SHANGHAI BIXIUFU ENTERPRISE MANAGEMENT CO., LTD. (CN) | 2020-10-29 | — | — | US | disclosed |
| EP-3702837-A1 | PHOTOLITHOGRAPHY METHOD, PHOTOLITHOGRAPHY PRODUCT AND PHOTOLITHOGRAPHY MATERIAL | Shanghai Bixiufu Enterprise Management Co., Ltd. (CN) | 2020-09-02 | — | — | EP | disclosed |
| CN-111393367-A | N-para-sulfonium salt substituted pyrazoline derivative, photocuring composition and preparation method | 浙江扬帆新材料股份有限公司 | 2020-07-10 | — | — | CN | disclosed |
| CN-110554569-A | Resist composition and patterning method | SHINETSU CHEMICAL CO | 2019-12-10 | — | — | CN | disclosed |
| CN-109073974-A | The negative photosensitive composition of low-temperature curable | AZ电子材料（卢森堡）有限公司 | 2018-12-21 | — | — | CN | disclosed |
| CN-107077070-A | The manufacture method of photosensitive polymer combination, cured film, the element for possessing cured film and semiconductor devices | 东丽株式会社 | 2017-08-18 | — | — | CN | disclosed |
| CN-105263482-A | Treatment of gastrointestinal and other disorders | NUMEDII INC | 2016-01-20 | — | — | CN | disclosed |
| WO-2014033967-A1 | PHOTO ACID GENERATOR AND ITS SYNTHETIC METHOD | RHODIA OPERATIONS (FR) | 2014-03-06 | — | — | WO | disclosed |
| CN-101304978-A | Quinazoline derivatives as multiplex inhibitors and process for their preparation | HANMI PHARM IND CO LTD (KR) | 2008-11-12 | — | — | CN | disclosed |
| US-7371503-B2 | Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-05-13 | — | — | US | disclosed |
| US-7235343-B2 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-26 | — | — | US | disclosed |
| US-20060141383-A1 | Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions | JSR CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1586570-A1 | SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-20040229162-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-11-18 | — | — | US | disclosed |
| US-20030220524-A1 | Sulfur containing compounds | LANGLER RICHARD FRANCIS (CA) | 2003-11-27 | — | — | US | disclosed |
| EP-1259482-A2 | SULFUR CONTAINING COMPOUNDS | University Health Network (CA) | 2002-11-27 | — | — | EP | disclosed |
| WO-2001062668-A2 | SULFUR CONTAINING COMPOUNDS | UNIVERSITY HEALTH NETWORK (CA) | 2001-08-30 | — | — | WO | disclosed |
| US-5648196-A | Water-soluble photoinitiators | CORNELL RESEARCH FOUNDATION, INC. (US) | 1997-07-15 | — | — | US | disclosed |