Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 2/20 | 0.30 |
| ▸ | CA2 | P00918 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL516312 | 0.87 | CA1 (0.34) | CA1CA2 | |
| SCHEMBL515864 | 0.86 | CA1 (0.35) | CA1CA2 | |
| SCHEMBL702251 | 0.84 | ALDH1A1 (0.33) | ALDH1A1TSHRHTT | |
| SCHEMBL704509 | 0.83 | ALDH1A1 (0.33) | ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL4307394 | 0.82 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL5365271 | 0.82 | — | — | |
| SCHEMBL5353994 | 0.81 | CYP1A2 (0.32) | — | |
| SCHEMBL701702 | 0.81 | TSHR (0.42) | ALDH1A1TSHRGAAHTTNPSR1 | |
| SCHEMBL3159376 | 0.81 | HTT (0.33) | ALDH1A1TSHRHTT | |
| SCHEMBL5366389 | 0.81 | CA1 (0.30) | CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7371503-B2 | Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-05-13 | — | — | US | disclosed |
| US-20060141383-A1 | Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions | JSR CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1586570-A1 | SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |