SCHEMBL499817

SCHEMBL499817

CCCC(CC(=O)O)C(F)(F)F

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 4/20 0.39
HDAC1 Q13547 2/20 0.39
HDAC2 Q92769 2/20 0.39
ADRA1A P35348 2/20 0.39
TDP1 Q9NUW8 2/20 0.39
CHRM1 P11229 1/20 0.39
AKR1A1 P14550 1/20 0.39
CHRM3 P20309 1/20 0.39
HTR2A P28223 1/20 0.39
HTR2C P28335 1/20 0.39
HRH1 P35367 1/20 0.39
DRD3 P35462 1/20 0.39
SLC6A3 Q01959 1/20 0.39
CYP3A4 P08684 2/20 0.33
TSHR P16473 2/20 0.33
NFKB1 P19838 2/20 0.33
NPSR1 Q6W5P4 2/20 0.33
SLC22A6 Q4U2R8 1/20 0.33
FFAR3 O14843 1/20 0.33
HDAC3 O15379 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8433897 0.88 GPR84 (0.46) GPR84S1PR2S1PR1MAPT
Hydrochloric Acid SCHEMBL9624578 0.86 GPR84 (0.44) GPR84S1PR2S1PR1MAPT
SCHEMBL28256486 0.84 CHRM1 (0.36) HDAC1HDAC2ADRA1ATDP1CHRM1
SCHEMBL8433717 0.84 GPR84 (0.56) GPR84TSHRSLC22A6S1PR2S1PR1
SCHEMBL1604218 0.82 SLC22A6 (0.36) GPR84ADRA1ATDP1SLC22A6FFAR3
SCHEMBL8877183 0.81 SLC22A6 (0.43) ADRA1ATDP1TSHRSLC22A6CACNA2D1
SCHEMBL4294171 0.81 CHRM1 (0.33) HDAC1HDAC2ADRA1ATDP1CHRM1
SCHEMBL10454282 0.81 GPR84 (0.38) GPR84HDAC1HDAC2ADRA1ATDP1
SCHEMBL8686794 0.81 HDAC1 (0.42) GPR84HDAC1HDAC2ADRA1ATDP1
SCHEMBL15554136 0.80 HDAC1 (0.41) GPR84HDAC1HDAC2ADRA1ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240043593-A1 Fluorine-Containing Polymer CENTRAL GLASS COMPANY, LIMITED (JP) 2024-02-08 US disclosed
US-8105760-B2 Patterning process and pattern surface coating composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-31 US disclosed
US-20110123925-A1 POLYMER FOR PROTECTIVE LAYER OF RESIST, AND POLYMER COMPOSITION INCLUDING THE SAME CHEIL INDUSTRIES, INC. (KR) 2011-05-26 US disclosed
US-7759047-B2 Resist protective film composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-07-20 US disclosed
US-7666572-B2 Resist top coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-02-23 US disclosed
US-20090053657-A1 PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-26 US disclosed
US-20070298355-A1 Resist top coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-12-27 US disclosed
US-20070275326-A1 Resist protective film composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-11-29 US disclosed
US-7297461-B2 Radiation sensitive resin composition JSR CORPORATION (JP) 2007-11-20 US disclosed
US-20060194143-A1 Fluorine-containing polymerizable monomers, fluorine-containing polymer compounds, resist compositions using the same, and patterning process CENTRAL GLASS COMPANY, LIMITED (JP) 2006-08-31 US disclosed
US-20050171226-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2005-08-04 US disclosed