Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR84 | Q9NQS5 | 4/20 | 0.46 |
| ▸ | CA2 | P00918 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | FDPS | P14324 | 1/20 | 0.39 |
| ▸ | Q9HBH1 | 1/20 | 0.39 | |
| ▸ | CTSL | P07711 | 1/20 | 0.38 |
| ▸ | CTSS | P25774 | 1/20 | 0.38 |
| ▸ | CTSK | P43235 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | S1PR2 | O95136 | 1/20 | 0.38 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.37 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.37 |
| ▸ | FAAH | O00519 | 1/20 | 0.36 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.36 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.36 |
| ▸ | MMP1 | P03956 | 2/20 | 0.36 |
| ▸ | MMP2 | P08253 | 2/20 | 0.36 |
| ▸ | MMP3 | P08254 | 2/20 | 0.36 |
| ▸ | MMP7 | P09237 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL9624578 | 0.98 | GPR84 (0.44) | GPR84CA2MAPK1FDPSPDF | |
| SCHEMBL8433717 | 0.92 | GPR84 (0.56) | GPR84FDPSMAPTS1PR2S1PR1 | |
| SCHEMBL499817 | 0.88 | GPR84 (0.39) | GPR84MAPTS1PR2S1PR1 | |
| SCHEMBL9624573 | 0.82 | ALDH1A1 (0.40) | CA2MAPK1FDPSCTSLCTSS | |
| SCHEMBL9624831 | 0.82 | AKR1B1 (0.45) | GPR84MAPTS1PR2S1PR1AKR1B1 | |
| SCHEMBL20222968 | 0.82 | GPR84 (0.47) | GPR84CA2MAPK1FDPSPDF | |
| SCHEMBL20222989 | 0.82 | GPR84 (0.47) | GPR84CA2MAPK1FDPSPDF | |
| SCHEMBL18822157 | 0.81 | GPR84 (0.52) | GPR84FDPSMAPTS1PR2S1PR1 | |
| SCHEMBL9419145 | 0.79 | CA1 (0.42) | CA2FDPSCTSLCTSSCTSK | |
| SCHEMBL1987290 | 0.79 | FDPS (0.41) | CA2MAPK1FDPSCTSLCTSS |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5672742-A | AN ALPHA,ALPHA-BIS(TRIFLUOROMETHYL)ARYLACETIC ACID ESTER IS CONVERTED TO THE CORRESPONDING CARBOXYLIC ACID SALT UNDER ACTION OF BASE AND WATER; DECARBOXYLATION; HYDROLYSIS | NIPPON MEKTRON LIMITED (JP) | 1997-09-30 | — | — | US | claimed |
| JP-1242543-A | — | — | None | — | — | JP | disclosed |
| JP-8333303-A | — | — | None | — | — | JP | disclosed |
| JP-8333358-A | — | — | None | — | — | JP | disclosed |
| EP-0499221-B1 | Optically active compound, liquid crystal composition, liquid crystal device, display apparatus and display method | CANON KK (JP) | 1999-12-08 | — | — | EP | disclosed |
| US-5808132-A | α,α-bis(trifluoromethyl)arylacetic acid ester; its intermediates for synthesis; and process for producing the same | NIPPON MEKTRON, LIMITED (JP) | 1998-09-15 | — | — | US | disclosed |
| US-5672742-A | AN ALPHA,ALPHA-BIS(TRIFLUOROMETHYL)ARYLACETIC ACID ESTER IS CONVERTED TO THE CORRESPONDING CARBOXYLIC ACID SALT UNDER ACTION OF BASE AND WATER; DECARBOXYLATION; HYDROLYSIS | NIPPON MEKTRON LIMITED (JP) | 1997-09-30 | — | — | US | disclosed |
| US-5672742-A | AN ALPHA,ALPHA-BIS(TRIFLUOROMETHYL)ARYLACETIC ACID ESTER IS CONVERTED TO THE CORRESPONDING CARBOXYLIC ACID SALT UNDER ACTION OF BASE AND WATER; DECARBOXYLATION; HYDROLYSIS | NIPPON MEKTRON LIMITED (JP) | 1997-09-30 | — | — | US | disclosed |
| US-5672742-A | AN ALPHA,ALPHA-BIS(TRIFLUOROMETHYL)ARYLACETIC ACID ESTER IS CONVERTED TO THE CORRESPONDING CARBOXYLIC ACID SALT UNDER ACTION OF BASE AND WATER; DECARBOXYLATION; HYDROLYSIS | NIPPON MEKTRON LIMITED (JP) | 1997-09-30 | — | — | US | disclosed |
| JP-H08333358-A | PERFLUORO(2-METHYL-1,2-EPOXYPROPYL) ETHER COMPOUND AND ITS PRODUCTION | NIPPON MEKTRON LTD | 1996-12-17 | — | — | JP | disclosed |
| US-5098600-A | Composites of heteroaryl liquid crystal compounds | CANON KABUSHIKI KAISHA (JP) | 1992-03-24 | — | — | US | disclosed |
| EP-0301511-B1 | OPTICALLY ACTIVE COMPOUND AND LIQUID CRYSTAL COMPOSITION CONTAINING SAME | CANON KABUSHIKI KAISHA (JP) | 1992-01-22 | — | — | EP | disclosed |
| US-5073306-A | Trifluoromethylalkyl substituted | CANON KABUSHIKI KAISHA (JP) | 1991-12-17 | — | — | US | disclosed |
| EP-0440134-A1 | Mesomorphic compound, liquid crystal composition containing same, liquid crystal device using same and display apparatus | CANON KABUSHIKI KAISHA (JP) | 1991-08-07 | — | — | EP | disclosed |
| EP-0435106-A2 | Liquid crystal compound, liquid crystal composite including the compound and liquid crystal device utilizing the composite | CANON KABUSHIKI KAISHA (JP) | 1991-07-03 | — | — | EP | disclosed |
| US-4917817-A | Optical active compound, process for producing same and liquid crystal composition containing same | CANON KABUSHIKI KAISHA (JP) | 1990-04-17 | — | — | US | disclosed |
| US-4918213-A | HAVING A TRIFLUOROMETHYL GROUP ATTACHED TO ASYMMETRIC CARBON ATOM; STABLE; OPTICAL DEVICES | CANON KABUSHIKI KAISHA (JP) | 1990-04-17 | — | — | US | disclosed |
| JP-H01242543-A | LIQUID CRYSTAL COMPOUND AND LIQUID CRYSTAL COMPOSITION AND ELEMENT CONTAINING SAID COMPOUND | CANON INC | 1989-09-27 | — | — | JP | disclosed |
| EP-0301511-A1 | Optically active compound and liquid crystal composition containing same | CANON KABUSHIKI KAISHA (JP) | 1989-02-01 | — | — | EP | disclosed |
| EP-0300497-A1 | Optically active compound, process for producing same and liquid crystal composition containing same | CANON KABUSHIKI KAISHA (JP) | 1989-01-25 | — | — | EP | disclosed |