SCHEMBL499886

SCHEMBL499886

O=C(O)CCN1CCOC(CC2CCCO2)C1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GLA P06280 3/20 0.45
ALDH1A1 P00352 7/20 0.44
PKM P14618 1/20 0.40
KDM4E B2RXH2 8/20 0.39
HPGD P15428 3/20 0.38
GAA P10253 3/20 0.38
CASP1 P29466 1/20 0.38
HSD17B10 Q99714 1/20 0.38
LMNA P02545 2/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
NPSR1 Q6W5P4 1/20 0.37
POLB P06746 1/20 0.37
USP2 O75604 1/20 0.37
KMT2A Q03164 2/20 0.36
MEN1 O00255 1/20 0.36
CYP2C19 P33261 1/20 0.36
RECQL P46063 1/20 0.36
TP53 P04637 1/20 0.36
ALOX12 P18054 1/20 0.36
TDP1 Q9NUW8 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL500357 0.79 GLA (0.50) GLAALDH1A1HSD17B10SMN1; SMN2KMT2A
SCHEMBL13229803 0.77 GLA (0.44) GLAALDH1A1KDM4EHPGDGAA
SCHEMBL499919 0.75 GLA (0.46) GLAALDH1A1GAAHSD17B10LMNA
SCHEMBL499961 0.74 GLA (0.45) GLAALDH1A1KDM4ELMNAKMT2A
SCHEMBL500411 0.74 GLA (0.45) GLAALDH1A1PKMHSD17B10KMT2A
SCHEMBL500330 0.73 GLA (0.44) GLAALDH1A1TDP1
SCHEMBL500093 0.72 GLA (0.53) GLAALDH1A1HSD17B10SMN1; SMN2KMT2A
SCHEMBL12331035 0.72 GLA (0.53) GLAALDH1A1KDM4EGAAHSD17B10
SCHEMBL4190132 0.72 GLA (0.41) GLAALDH1A1KDM4EHSD17B10SMN1; SMN2
SCHEMBL499881 0.71 GLA (0.42) GLAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8105760-B2 Patterning process and pattern surface coating composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-31 US disclosed
US-20090053657-A1 PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-26 US disclosed