Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GLA | P06280 | 1/20 | 0.53 |
| ▸ | KDM1A | O60341 | 1/20 | 0.43 |
| ▸ | DRD1 | P21728 | 1/20 | 0.41 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.41 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.38 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | GLRA1 | P23415 | 1/20 | 0.35 |
| ▸ | WNT1 | P04628 | 1/20 | 0.34 |
| ▸ | GSK3B | P49841 | 1/20 | 0.34 |
| ▸ | DYRK1A | Q13627 | 1/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | APEX1 | P27695 | 1/20 | 0.34 |
| ▸ | DRD3 | P35462 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL715037 | 0.82 | HSD17B10 (0.50) | GLAKDM1ADRD1PDK1HSD17B10 | |
| SCHEMBL28864627 | 0.82 | HSD17B10 (0.50) | GLAKDM1ADRD1PDK1HSD17B10 | |
| SCHEMBL28864611 | 0.82 | HSD17B10 (0.50) | GLAKDM1ADRD1PDK1HSD17B10 | |
| SCHEMBL28130134 | 0.82 | SMN1; SMN2 (0.48) | GLAKDM1ADRD1PDK1SMN1; SMN2 | |
| SCHEMBL28141848 | 0.81 | PDK1 (0.39) | GLAKDM1ADRD1PDK1ALDH1A1 | |
| Hydrochloric Acid SCHEMBL5092822 | 0.81 | HSD17B10 (0.48) | GLAKDM1ADRD1PDK1HSD17B10 | |
| SCHEMBL500357 | 0.80 | GLA (0.50) | GLAOPRM1OPRD1HSD17B10SMN1; SMN2 | |
| SCHEMBL12331035 | 0.79 | GLA (0.53) | GLAPDK1OPRM1OPRD1HSD17B10 | |
| Acetic Acid SCHEMBL28685632 | 0.79 | EBP (0.44) | KDM1ADRD1PDK1KMT2AALDH1A1 | |
| SCHEMBL12206843 | 0.79 | GLA (0.49) | GLAOPRM1OPRD1HSD17B10SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103980204-B | Ionic liquid-catalyzed amine and α, β-unsaturated electron deficiency receptor method | TAIZHOU UNIVERSITY (CN) | 2016-03-30 | — | — | CN | disclosed |
| CN-103980204-A | Method for catalyzing amines and alpha, beta-unsaturated electron-deficient acceptors by ionic liquid | UNIV TAIZHOU | 2014-08-13 | — | — | CN | disclosed |
| US-20130060013-A1 | Compounds useful for treating neurodegenerative disorders | SATORI PHARMACEUTICALS, INC. (US) | 2013-03-07 | — | — | US | disclosed |
| US-8105760-B2 | Patterning process and pattern surface coating composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-20110251379-A1 | COMPOUNDS USEFUL FOR TREATING NEURODEGENERATIVE DISORDERS | SATORI PHARMACEUTICALS, INC. (US) | 2011-10-13 | — | — | US | disclosed |
| CN-1947066-B | Rinse solution for lithography | TOKYO OHKA KOGYO CO LTD | 2011-04-13 | — | — | CN | disclosed |
| US-20090053657-A1 | PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |
| CN-101010640-A | Developing solution composition for lithography and method for resist pattern formation | TOKYO OHKA KOGYO CO LTD (JP) | 2007-08-01 | — | — | CN | disclosed |
| CN-1947066-A | Rinse solution for lithography | TOKYO OHKA KOGYO CO LTD (JP) | 2007-04-11 | — | — | CN | disclosed |
| US-20050282387-A1 | Metal polish composition, polishing method using the composition and method for producing wafer using the polishing method | SHOWA DENKO K.K. (JP) | 2005-12-22 | — | — | US | disclosed |
| EP-1517972-A1 | METAL POLISH COMPOSITION, POLISHING METHOD USING THE COMPOSITION AND METHOD FOR PRODUCING WAFER USING THE POLISHING METHOD | Showa Denko K.K. (JP) | 2005-03-30 | — | — | EP | disclosed |
| WO-2003104350-A1 | METAL POLISH COMPOSITION, POLISHING METHOD USING THE COMPOSITION AND METHOD FOR PRODUCING WAFER USING THE POLISHING METHOD | SHOWA DENKO K.K. (JP) | 2003-12-18 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130060013-A1 | Compounds useful for treating neurodegenerative disorders | SNCA, HTT, CLN6 | GLA 330/4885KDM1A 3542/4885DRD1 2209/4885 |
| US-20110251379-A1 | COMPOUNDS USEFUL FOR TREATING NEURODEGENERATIVE DISORDERS | CLN6, NLN, ACHE | GLA 191/4885KDM1A 2863/4885DRD1 2736/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.