Diphenylsulfane

Diphenylsulfane

SCHEMBL4999344

CCCCS(=O)(=O)Oc1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)cc1.c1ccc(Sc2ccccc2)cc1

nearest known ligand 0.38

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PIK3CD O00329 1/20 0.38
PIK3CA P42336 1/20 0.38
PIK3CB P42338 1/20 0.38
CA1 P00915 6/20 0.34
CA2 P00918 6/20 0.34
ALPL P05186 3/20 0.34
ALPI P09923 3/20 0.34
AR P10275 1/20 0.33
JAK2 O60674 1/20 0.33
JAK3 P52333 1/20 0.33
PTK2 Q05397 1/20 0.33
MMP8 P22894 2/20 0.32
MMP13 P45452 2/20 0.32
MMP3 P08254 1/20 0.32
STS P08842 1/20 0.32
KMT2A Q03164 1/20 0.31
LTA4H P09960 1/20 0.31
MMP2 P08253 2/20 0.31
MMP9 P14780 2/20 0.31
MMP1 P03956 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Diphenylsulfane SCHEMBL5652159 0.89 MMP13 (0.46) PIK3CDPIK3CAPIK3CBCA1CA2
Diphenylsulfane SCHEMBL5648126 0.85 PIK3CD (0.37) PIK3CDPIK3CAPIK3CBCA1CA2
Diphenylsulfane SCHEMBL1772327 0.85 PIK3CD (0.45) PIK3CDPIK3CAPIK3CBCA1CA2
Diphenylsulfane SCHEMBL6501320 0.84 STS (0.45) PIK3CDPIK3CAPIK3CBCA1CA2
SCHEMBL2572784 0.84 STS (0.45) PIK3CDPIK3CAPIK3CBCA1CA2
SCHEMBL6232346 0.82 CA1 (0.36) PIK3CDPIK3CAPIK3CBCA1CA2
Diphenylsulfane SCHEMBL18863901 0.82 PIK3CD (0.41) PIK3CDPIK3CAPIK3CBCA1CA2
Diphenylsulfane SCHEMBL4999052 0.82 PIK3CD (0.41) PIK3CDPIK3CAPIK3CBCA1CA2
Diphenylsulfane SCHEMBL5648428 0.81 PIK3CD (0.41) PIK3CDPIK3CAPIK3CBCA1CA2
Diphenylsulfane SCHEMBL4990263 0.80 PIK3CD (0.42) PIK3CDPIK3CAPIK3CBCA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7371503-B2 Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-05-13 US disclosed
US-7217492-B2 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2007-05-15 US disclosed
US-20060141383-A1 Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions JSR CORPORATION (JP) 2006-06-29 US disclosed
US-20050053861-A1 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2005-03-10 US disclosed