SCHEMBL6232346

SCHEMBL6232346

CCCCS(=O)(=O)Oc1ccc(S(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 5/20 0.36
CA2 P00918 5/20 0.36
MMP2 P08253 2/20 0.34
MMP9 P14780 2/20 0.34
MMP14 P50281 2/20 0.34
MMP7 P09237 1/20 0.34
JAK2 O60674 1/20 0.33
JAK3 P52333 1/20 0.33
PTK2 Q05397 1/20 0.33
PIK3CD O00329 1/20 0.33
PIK3CA P42336 1/20 0.33
PIK3CB P42338 1/20 0.33
ALPL P05186 2/20 0.33
ALPI P09923 2/20 0.33
ABCB1 P08183 1/20 0.32
ALDH1A1 P00352 1/20 0.32
TSHR P16473 1/20 0.32
PTGS2 P35354 1/20 0.32
AR P10275 1/20 0.32
HSD11B1 P28845 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3104520 0.86 CA1 (0.45) CA1CA2ABCB1ALDH1A1TSHR
SCHEMBL3130573 0.85 CA1 (0.44) CA1CA2ABCB1ALDH1A1TSHR
SCHEMBL3126070 0.85 CA1 (0.44) CA1CA2ABCB1ALDH1A1TSHR
Diphenylsulfane SCHEMBL4999344 0.82 PIK3CD (0.38) CA1CA2MMP2MMP9MMP14
SCHEMBL5856183 0.82 MEN1 (0.47) CA1CA2ALDH1A1LMNA
SCHEMBL5646912 0.81 CA2 (0.41) CA1CA2ALDH1A1
SCHEMBL6310046 0.81 CA1 (0.49) CA1CA2MMP2MMP14TSHR
SCHEMBL5857351 0.81 MEN1 (0.46) CA1CA2ALDH1A1LMNA
SCHEMBL270993 0.80 HSD11B1 (0.44) CA1CA2ALDH1A1HSD11B1LMNA
SCHEMBL3126981 0.80 HSD11B1 (0.44) CA1CA2ALDH1A1HSD11B1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1586570-A1 SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2005-10-19 EP disclosed