SCHEMBL5000767

SCHEMBL5000767

O=C(O)C12CC3CC(C#CC45CC6CC(CC(C6)C4)C5)(C1)CC(C(=O)O)(C3)C2

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.38
PKM P14618 1/20 0.38
ALDH1A1 P00352 4/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
LMNA P02545 1/20 0.36
MAPT P10636 1/20 0.36
THRB P10828 1/20 0.35
CYP2C9 P11712 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
HSD11B1 P28845 2/20 0.34
HTT P42858 2/20 0.34
KDM4E B2RXH2 1/20 0.34
MAPK1 P28482 1/20 0.33
GAA P10253 1/20 0.32
P2RX7 Q99572 1/20 0.32
CRHBP P24387 1/20 0.32
CRHR2 Q13324 1/20 0.32
MCOLN3 Q8TDD5 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL5004436 0.98 L3MBTL1 (0.41) L3MBTL1PKMALDH1A1SMN1; SMN2LMNA
SCHEMBL5004434 0.86 SMN1; SMN2 (0.36) L3MBTL1ALDH1A1SMN1; SMN2LMNAMAPT
SCHEMBL282760 0.78 PKM (0.42) L3MBTL1PKMALDH1A1SMN1; SMN2LMNA
SCHEMBL2747494 0.78 PKM (0.33) L3MBTL1PKMALDH1A1SMN1; SMN2LMNA
Hydrochloric Acid SCHEMBL4580832 0.76 PKM (0.46) L3MBTL1PKMALDH1A1SMN1; SMN2LMNA
SCHEMBL2748364 0.76 L3MBTL1 (0.41) L3MBTL1PKMALDH1A1SMN1; SMN2LMNA
SCHEMBL5081752 0.76 PKM (0.34) L3MBTL1PKMALDH1A1
SCHEMBL2707883 0.74 GRM5 (0.38) SMN1; SMN2LMNAMAPTMEN1KMT2A
SCHEMBL6152600 0.74 PKM (0.47) L3MBTL1PKMALDH1A1SMN1; SMN2LMNA
SCHEMBL164232 0.74 L3MBTL1 (0.58) L3MBTL1PKMALDH1A1SMN1; SMN2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed