SCHEMBL5000829

SCHEMBL5000829

COC(=O)c1cc(C#Cc2ccc(C34CC5CC(C)(CC(C)(C5)C3)C4)cc2)cc(C(=O)OC)c1

nearest known ligand 0.41

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
PGR P06401 7/20 0.41
HIF1A Q16665 8/20 0.40
EPAS1 Q99814 2/20 0.39
EPHX2 P34913 1/20 0.39
MDH1 P40925 2/20 0.38
MDH2 P40926 2/20 0.38
EP300 Q09472 1/20 0.38
PTPN11 Q06124 1/20 0.36
CYP3A4 P08684 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2709920 0.87 RARB (0.42) PGREPHX2CYP3A4
Potassium Ion SCHEMBL5000812 0.85 EPHX2 (0.37) PGREPHX2PTPN11CYP3A4
SCHEMBL2709090 0.84 RARB (0.40) PGRHIF1AEPAS1EPHX2CYP3A4
SCHEMBL2709689 0.77 RARB (0.39) PGREPHX2PTPN11CYP3A4
SCHEMBL2710393 0.75 RARB (0.40) PGRHIF1AEPAS1EPHX2CYP3A4
SCHEMBL2708322 0.75 RARB (0.40) PGRHIF1AEPAS1EPHX2CYP3A4
SCHEMBL5081782 0.74 HIF1A (0.51) PGRHIF1AEPAS1EPHX2MDH1
SCHEMBL3179396 0.74 RARB (0.37) PGRHIF1AEPAS1EPHX2PTPN11
SCHEMBL5000831 0.72 PTPN11 (0.32) PGREPHX2PTPN11
SCHEMBL2708265 0.72 RARB (0.39) PGRHIF1AEPAS1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed