SCHEMBL5000842

SCHEMBL5000842

C#Cc1c(C23CC4CC(CC(C4)C2)C3)cc2c(c1C13CC4CC(CC(C4)C1)C3)C(c1ccc(O)c(N)c1)(c1ccc(O)c(N)c1)c1ccccc1-2

nearest known ligand 0.36

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.36
ESR2 Q92731 1/20 0.36
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
POLB P06746 1/20 0.35
GAA P10253 1/20 0.35
GFER P55789 1/20 0.35
KDM4E B2RXH2 1/20 0.32
LMNA P02545 1/20 0.32
MAPT P10636 1/20 0.32
OPRK1 P41145 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
RARB P10826 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2708455 0.84 ESR1 (0.40) ESR1ESR2MEN1KMT2APOLB
SCHEMBL2747752 0.80 MEN1 (0.41) MEN1KMT2APOLBGAAGFER
SCHEMBL5006707 0.73 ESR1 (0.38) ESR1ESR2MEN1KMT2APOLB
SCHEMBL29488302 0.71 ESR1 (0.65) ESR1ESR2MEN1KMT2APOLB
SCHEMBL31220287 0.71 ESR1 (0.65) ESR1ESR2MEN1KMT2APOLB
SCHEMBL31296636 0.71 ESR1 (0.65) ESR1ESR2MEN1KMT2APOLB
SCHEMBL1482551 0.71 ESR1 (0.65) ESR1ESR2MEN1KMT2APOLB
SCHEMBL2707398 0.71 MEN1 (0.55) ESR1ESR2MEN1KMT2APOLB
SCHEMBL2706969 0.70 KMT2A (0.46) ESR1ESR2MEN1KMT2APOLB
SCHEMBL2706992 0.70 MEN1 (0.35) ESR1ESR2MEN1KMT2APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed