⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13906725 | 0.81 | ALDH1A1 (0.31) | — | |
| SCHEMBL5001239 | 0.77 | — | — | |
| SCHEMBL5001237 | 0.76 | — | — | |
| SCHEMBL19771561 | 0.73 | — | — | |
| SCHEMBL24008859 | 0.72 | — | — | |
| SCHEMBL17539196 | 0.68 | ALDH1A1 (0.37) | — | |
| SCHEMBL74764 | 0.68 | ALDH1A1 (0.31) | — | |
| SCHEMBL13906726 | 0.68 | ALDH1A1 (0.31) | — | |
| SCHEMBL687414 | 0.67 | ALDH1A1 (0.46) | — | |
| SCHEMBL10087715 | 0.67 | ALDH1A1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7459261-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-02 | — | — | US | disclosed |
| US-7255973-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-14 | — | — | US | disclosed |
| US-20060147836-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-07-06 | — | — | US | disclosed |
| US-20050227173-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2005-10-13 | — | — | US | disclosed |