SCHEMBL5005565

SCHEMBL5005565

CO[SiH](CC1=CCCCC1)OC

nearest known ligand 0.40

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.40
RAB9A P51151 4/20 0.40
ALOX15 P16050 1/20 0.39
MAPT P10636 1/20 0.38
HTT P42858 1/20 0.38
HSD17B10 Q99714 1/20 0.38
CXCR3 P49682 2/20 0.37
SMN1; SMN2 Q16637 3/20 0.36
NPC1 O15118 2/20 0.36
PKM P14618 1/20 0.35
GAA P10253 1/20 0.35
KDM4E B2RXH2 1/20 0.33
TSHR P16473 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5002876 0.81 ALDH1A1 (0.44) ALDH1A1RAB9AALOX15MAPTHTT
SCHEMBL4999934 0.81 ALDH1A1 (0.37) ALDH1A1RAB9AALOX15MAPTHTT
SCHEMBL1050390 0.72
SCHEMBL4272343 0.72 ALDH1A1 (0.41) ALDH1A1RAB9AALOX15MAPTCXCR3
SCHEMBL1051261 0.71 CXCR3 (0.42) ALDH1A1RAB9AALOX15MAPTHTT
SCHEMBL1054489 0.71 CXCR3 (0.42) ALDH1A1RAB9AALOX15MAPTHTT
SCHEMBL1054487 0.71 CXCR3 (0.42) ALDH1A1RAB9AALOX15MAPTHTT
SCHEMBL17241762 0.71 ALDH1A1 (0.40) ALDH1A1RAB9AALOX15MAPTCXCR3
SCHEMBL28107737 0.69 ALDH1A1 (0.41) ALDH1A1RAB9AALOX15MAPTHTT
SCHEMBL19277217 0.69 ALDH1A1 (0.47) ALDH1A1RAB9AALOX15MAPTHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7413775-B2 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION (JP) 2008-08-19 US disclosed
US-7160625-B2 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION (JP) 2007-01-09 US disclosed
US-20060127683-A1 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION 2006-06-15 US disclosed
US-20030180550-A1 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION 2003-09-25 US disclosed
US-5594079-A COORDINATION CATALYST CONTAINING BORON, STEREOREGULAR POLYPROPYLENE TOSOH CORPORATION (JP) 1997-01-14 US disclosed
US-5489634-A EFFICIENT SELECTIVE CATALYTIC POLYMERIZATION OF ALPHA-OLEFINS YIELDS HIGH MOLECULAR WEIGHT SPHERICAL PARTICLES HAVING HIGH BULK DENSITY, CONTROLLED PARTICLE SIZE AND MOLECULAR WEIGHT DISTRIBUTION TOSOH CORPORATION (JP) 1996-02-06 US disclosed
EP-0582278-A2 Method for producing a polyolefin TOSOH CORPORATION (JP) 1994-02-09 EP disclosed
EP-0530814-A1 Method for producing a stereospecific polyolefin TOSOH CORPORATION (JP) 1993-03-10 EP disclosed